Asml Netherlands B.v.

David Lucien Anstotz

Johannes Henricus Wilhelmus Jacobs

Edwin Cornelis Kadijk

Jan Cornelis Van Der Hoeven

Johannes Catharinus Hubertus Mulkens

Bob Streefkerk

Martinus Hendrikus Antonius Leenders

Joost Jeroen Ottens

Marco Koert Stavenga

Koen Jacobus Johannes Maria Zaal

Roelof Frederik De Graaf

Frits Van Der Meulen

Marcel Beckers

Richard Joseph Bruls

Paulus Martinus Maria Liebregts

Marinus Aart Van Den Brink

Leon Martin Levasier

Frederik Eduard De Jong

Youri Johannes Laurentius Maria Van Dommelen

Marcel Hendrikus Maria Beems

Paul Petrus Joannes Berkvens

Johannes Wilhelmus De Klerk

Gert-Jan Gerardus Johannes Thomas Brands

Peter Franciscus Wanten

Rudy Jan Maria Pellens

Marcus Johannes Van Der Zanden

Coen Cornelis Wilhelmus Verspaget

Casper Roderik De Groot

Vijay Kumar Badam

Marteijn De Jong

Jeroen Van Den Akker

Thijs Egidius Johannes Knaapen

Rudolf Adrianus Joannes Maas

Richard Bernardus Johannes Droste

Martijn Hendrik Kamphuis

A lithographic apparatus having a table including a target and/or a sensor and a liquid displacing device to displace liquid from the target and/or sensor using a localized gas flow is disclosed. The liquid displacement device may be positioned at various positions, e.g. mounted to a liquid handling device at an exposure station, adjacent or in a transfer path between the exposure station and a measurement station, at a load/unload station or adjacent a sensor.

Lithographic apparatus and device manufacturing method

An immersion lithographic apparatus is described in which an inlet is provided to provide cleaning fluid to a space between an object, such as a substrate, positioned on a substrate table and the substrate table.

Lithographic apparatus and method of cleaning a lithographic apparatus

A method of operating a fluid confinement system of an immersion lithographic apparatus is disclosed. The performance of the liquid confinement system is measured in several different ways. On the basis of the result of the measurement of performance, a signal indicating, for example, that a remedial action may need to be taken is generated.

Methods relating to immersion lithography and an immersion lithographic apparatus

An immersion lithographic apparatus is described with a drain configured to remove liquid from a gap between an edge of the substrate and the substrate table on which the substrate is supported. The drain is provided with a means to provide liquid to the drain irrespective of the position of the substrate table and/or a means to saturate gas within the drain. Those measures reduce the variations in heat load due to evaporation of liquid in the drain.

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Eindhoven, Netherlands

David Lucien Anstotz