Az Electronic Materials USA Corp.

David L Rentkiewicz

M Dalil Rahman

Ralph R Dammel

Munirathna Padmanaban

Francis Michael Houlihan

Clement Anyadiegwu

SangHo Lee

Takanori Kudo

Srinivasan Chakrapani

Muthiah Thiyagarajan

Karl Van Werden

Photoresist compositions

The present application relates to a compound of formula A-X&#x2014;B, where (i) A-X&#x2014;B form an ionic compound Ai Xi Bi where Ai and Bi are each individually an organic onium cation; and Xi is anion of the formula Q-R&#x2014;SOor (ii) A-X&#x2014;B form a non-ionic compound Ac-Xc-Bc, where Ai, Bi, Q, R, Ac, Bc, and Xc are defined herein. The compounds are useful as photoactive materials.

Photoactive compounds

The present application relates to photoactive materials having the formula wherein C1is a cation; each of R, R, R, R, R, R, R, R, R, R, R, and Rare selected from hydrogen, alkyl, alkyl chain optionally containing one or more O atoms, halide, aryl, aralkyl, alkoxyalkyl, cycloalkyl, hydroxyl, and alkoxy, the alkyl, alkyl chain optionally containing one or more O atoms, aryl, aralkyl, alkoxyalkyl, cycloalkyl, and alkoxy groups being unsubstituted or substituted.

The present application relates to a compound of formula A-X&#x2014;B, where (i)A-X&#x2014;B form an ionic compound Ai Xi Bi where Ai and Bi are each individually an organic onium cation; and Xi is anion of the formula Q-R&#x2014;SOor (ii)A-X&#x2014;B form a non-ionic compound Ac-Xc-Bc, where Ai, Bi, Q, R, Ac, Bc, and Xc are defined herein. The compounds are useful as photoactive materials.

The present application relates to a compound of formula Ai Xi Bi where Ai and Bi are each individually an organic onium cation; and Xi is anion of the formulaOS&#x2014;CFCFOCFCF&#x2014;SO. The compounds are useful as photoactive materials.

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North Brunswick, NJ, United States of America

David L Rentkiewicz