Sp .sup.3, Inc.

Genus, Inc.

David K Studley

Jerry Wayne Zimmer

James E Herlinger

Ernest Keller

An apparatus for adjusting the tension on a heating filament in a reactor used in carbon deposition on a substrate via chemical-vapor deposition is disclosed, as is a method for preventing breakage of the filaments during operation. The apparatus comprises a force regulator attached to an array of heating filaments. Preferably, the force regulator is adjustable and is adjusted prior to reactor operation and/or periodically or continuously as the filaments lengthen due to carburization in the carbon-vapor environment of the reactor. The adjustable force regulator attached to an array of filaments enables effective regulation of the force on a filament during reactor operation and provides an easily-maintained reactor with quick turn-around time between cycles of use.

Reactor having an array of heating filaments and a filament force

A seal ring presses against a wafer on a CVD chuck continuously around the outer periphery of the wafer, and with sufficient force to hold the backside of the wafer against the chuck, so no CVD material may deposit on the backside of the wafer. The seal ring has one surface for contacting the frontside of the wafer and a second surface that extends close to the CVD chuck, so the edge of the wafer is also excluded from CVD coating. With use of the wafer seal ring apparatus and method, CVD coating is confined to the frontside of a wafer. In a preferred embodiment, an apparatus with a slide operated by a cam lever and a tension spring for moving the seal ring and pressing it against a wafer on a CVD chuck is used with each of multiple chucks attached to a rotatable turret within a CVD chamber.

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Sunnyvale, CA, United States of America

David K Studley