University of California

Industrial Technology Research Institute

David Jen Hwang

Costas P Grigoropoulos

Samuel S Mao

Chung-Wei Cheng

Kuniaki Hiromatsu

Andrew M Minor

Moosung Kim

Methods of producing a nanostructure in a target film are provided. The method includes selectively irradiating at least one focusing element of a near-field focusing array that is in near-field focusing relationship with a target film in a manner sufficient to produce a nanostructure from the target film. Also provided are systems for practicing methods of the invention, as well as objects produced thereby.

Arbitrary pattern direct nanostructure fabrication methods and system

Laser-assisted apparatus and methods for performing nanoscale material processing, including nanodeposition of materials, can be controlled very precisely to yield both simple and complex structures with sizes less than 100 nm. Optical or thermal energy in the near field of a photon (laser) pulse is used to fabricate submicron and nanometer structures on a substrate. A wide variety of laser material processing techniques can be adapted for use including, subtractive (e.g., ablation, machining or chemical etching), additive (e.g., chemical vapor deposition, selective self-assembly), and modification (e.g., phase transformation, doping) processes. Additionally, the apparatus can be integrated into imaging instruments, such as SEM and TEM, to allow for real-time imaging of the material processing.

Laser-assisted nanomaterial deposition, nanomanufacturing, in situ monitoring and associated apparatus

A method for patterning crystalline indium tin oxide (ITO) using femtosecond laser is disclosed, which comprises steps of: (a) providing a substrate with an amorphous ITO layer thereon; (b) transferring the amorphous ITO layer in a predetermined area into a crystalline ITO layer by emitting a femtosecond laser beam to the amorphous ITO layer in the predetermined area; and (c) removing the amorphous ITO layer on the substrate using an etching solution.

Method for patterning crystalline indium tin oxide using femtosecond laser

A method for producing active glass nanoparticles that exhibit upconversion is described. The method employs pulsed-laser ablation of an active glass substrate using, for example, a high repetition rate ultra-short pulse duration laser under normal atmospheric conditions or in a liquid environment.

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Albany, CA, United States of America

David Jen Hwang