Newport Fab, LLC

Other

Tower Semiconductor Ltd.

Conexant Systems, Inc.

Newport Fab, LLC Dba Jazz Semiconductor

Samsung Electronics Co., Ltd.

Skyworks Solutions, Inc.

New Fab, LLC

David J Howard

Gregory P Slovin

Nabil El-Hinnawy

Jefferson E Rose

Michael J DeBar

Marco Racanelli

Arjun Kar-Roy

Edward J Preisler

Paul D Hurwitz

Chris Masse

Q Z Liu

Hadi H Abdul-Ridha

Dieter Dornisch

Jeff Rose

Greg D U'ren

Hadi Jebory

Bin Zhao

Yakov Roizin

Tinghao Frank Wang

George Talor

Rassul Karabalin

Mantavya Sinha

Todd Thibeault

Volker Blaschke

Daniel M So

Nabil EI-Hinnawy

Qz Liu

Gerson R Ortuno

Chris Cureton

Julia M Wu

Amol M Kalburge

Kevin Q Yin

Roda Kanawati

Kenneth M Ring

Guangming Li

Arjun Kar Roy

Abhijit B Joshi

Michael J Debar

Scott B Stetson

A semiconductor structure includes a substrate having a first dielectric constant, a porous semiconductor layer situated over the substrate, and a crystalline epitaxial layer situated over the porous semiconductor layer. A first semiconductor device is situated in the crystalline epitaxial layer. The porous semiconductor layer has a second dielectric constant that is substantially less than the first dielectric constant such that the porous semiconductor layer reduces signal leakage from the first semiconductor device. The semiconductor structure can include a second semiconductor device situated in the crystalline epitaxial layer, and an electrical isolation region separating the first and second semiconductor devices.

Method for forming a semiconductor structure having a porous semiconductor layer in RF devices

A bipolar complementary-metal-oxide-semiconductor (BiCMOS) device includes a MOS transistor including CMOS nickel silicided regions in a CMOS region, and a bipolar transistor in a bipolar region. The bipolar transistor includes a nickel silicided emitter, a collector, and a base including an intrinsic base, a link base, and a nickel silicided extrinsic base. The intrinsic base is situated between the nickel silicided emitter and the collector. A dielectric spacer separates the link base from the nickel silicided emitter. The nickel silicided extrinsic base provides an electrical connection to the link base and the intrinsic base. A nickel silicided collector sinker provides an electrical connection to the collector. The CMOS nickel silicided regions, nickel silicided emitter, nickel silicided extrinsic base, and nickel silicided collector sinker can include an additive of molybdenum (Mo) and/or platinum (Pt). A low temperature rapid thermal anneal can be performed so as to prevent deactivation of dopants.

Method of manufacturing bipolar complementary-metal-oxide-semiconductor (BiCMOS) devices using nickel silicide

Method of manufacturing nickel silicide in bipolar complementary-metal-oxide-semiconductor (BiCMOS)

A radio frequency (RF) device includes a phase-change material (PCM) situated over a sheet of thermally conductive and electrically insulating material, a heating element situated under the sheet of thermally conductive and electrically insulating material, and an input/output terminal situated over the PCM. The heating element is situated in a dielectric. A heat spreader is situated under the dielectric and over a substrate. Metal interconnect layers can be situated under and/or over the PCM, with the substrate situated below the metal interconnect layers.

Discrete and monolithic phase-change material (PCM) radio frequency (RF) switches with sheet of thermally conductive and electrically insulating material

Nickel silicide in bipolar complementary-metal-oxide-semiconductor (BiCMOS) device and method of manufacturing

In tuning a radio frequency (RF) module including a non-volatile tunable RF filter, a desired frequency and an undesired frequency being provided by an amplifier of the RF module are detected. The non-volatile tunable RF filter is coupled to an output of the amplifier of the RF module. A factory setting of an adjustable capacitor in the non-volatile tunable RF filter is changed by factory-setting a state of a non-volatile RF switch, such that the non-volatile tunable RF filter substantially rejects the undesired frequency and substantially passes the desired frequency. The adjustable capacitor includes the non-volatile RF switch, and the factory setting of the adjustable capacitor corresponds to a factory-set state of the non-volatile RF switch. An end-user is prevented access to the non-volatile RF switch, so as prevent the end-user from modifying the factory-set state of the non-volatile RF switch.

Radio frequency (RF) module using a tunable RF filter with non-volatile RF switches

A semiconductor structure includes a porous semiconductor segment adjacent to a first region of a substrate, and a crystalline epitaxial layer situated over the porous semiconductor segment and over the first region of the substrate. A first semiconductor device is situated in the crystalline epitaxial layer over the porous semiconductor segment. The first region of the substrate has a first dielectric constant, and the porous semiconductor segment has a second dielectric constant that is substantially less than the first dielectric constant such that the porous semiconductor segment reduces signal leakage from the first semiconductor device. The semiconductor structure can include a second semiconductor device situated in the crystalline epitaxial layer over the first region of the substrate, and an electrical isolation region separating the first and second semiconductor devices.

Semiconductor structure having porous semiconductor segment for RF devices and bulk semiconductor region for non-RF devices

Semiconductor structure having porous semiconductor layer for RF devices

A high-yield, tunable radio frequency (RF) filter includes a plurality of process-dependent capacitors and a plurality of non-volatile RF switches. Each of the plurality of process-dependent capacitors is connected to at least one of the plurality of non-volatile RF switches. An auxiliary capacitor in the plurality of process-dependent capacitors is engaged by an ON-state non-volatile RF switch in the plurality of non-volatile RF switches. A primary capacitor in the plurality of process-dependent capacitors is disengaged by an OFF-state non-volatile RF switch in the plurality of non-volatile RF switches. The auxiliary capacitor substitutes for the primary capacitor.

High-yield tunable radio frequency (RF) filter with auxiliary capacitors and non-volatile RF switches

In a first approach, a reconfigurable radio frequency (RF) filtering module includes a phase-change material (PCM) RF switch bank and an RF filter bank. Each RF filter in the RF filter bank is capable to be engaged and disengaged by a PCM RF switch in the PCM RF switch bank. In a second approach, a tunable RF filter includes PCM RF switches and a capacitor and/or an inductor. Each of the capacitor and/or inductor is capable to be engaged and disengaged by at least one PCM RF switch of the PCM RF switches. In a third approach, an adjustable passive component includes multiple segments and a PCM RF switch. A selectable segment in the multiple segments is capable to be engaged and disengaged by the PCM RF switch. In all approaches, each PCM RF switch includes a PCM and a heating element transverse to the PCM.

Radio frequency (RF) filtering using phase-change material (PCM) RF switches

A semiconductor structure includes a semiconductor substrate, a porous semiconductor region within the semiconductor substrate, and through-substrate via (TSV) within the porous semiconductor region. The porous semiconductor region causes the semiconductor structure and/or the TSV to withstand thermal and mechanical stresses. Alternatively, the semiconductor structure includes a semiconductor buffer ring within the porous semiconductor region, and the TSV within the semiconductor buffer ring.

Semiconductor structure having through-substrate via (TSV) in porous semiconductor region

Method of tuning a radio frequency (RF) module including a non-volatile tunable RF filter

A radio frequency (RF) switch includes a phase-change material (PCM), a heating element underlying an active segment of the PCM and extending outward and transverse to the PCM, a capacitive RF terminal, and an ohmic RF terminal. The capacitive RF terminal can include a first trench metal liner situated on a first passive segment of the PCM, and a dielectric liner separating the first trench metal liner from a first trench metal plug. The ohmic RF terminal can include a second trench metal liner situated on a second passive segment of the PCM, and a second trench metal plug ohmically connected to the second trench metal liner. Alternatively, the capacitive RF terminal and the ohmic RF terminal can include lower metal portions and upper metal portions. A MIM capacitor can be formed by the upper metal portion of the capacitive RF terminal, an insulator, and a patterned top plate.

Capacitive and ohmic terminals in a phase-change material (PCM) radio frequency (RF) switch

A non-volatile adjustable phase shifter is coupled to a transceiver in a wireless communication device. The non-volatile adjustable phase shifter includes a non-volatile radio frequency (RF) switch. In one implementation, the non-volatile RF switch is a phase-change material (PCM) RF switch. In one approach, the non-volatile adjustable phase shifter includes a selectable transmission delay arm and a selectable transmission reference arm. A phase shift caused by the non-volatile adjustable phase shifter is adjusted when the non-volatile RF switch engages with or disengages from the selectable transmission delay arm. In another approach, the non-volatile adjustable phase shifter includes a selectable impedance element. A phase shift caused by the non-volatile adjustable phase shifter is adjusted when the non-volatile RF switch engages with or disengages from the selectable impedance element. In either approach, the phase shift changes a phase of RF signals being transmitted from or received by the transceiver.

Non-volatile adjustable phase shifter using non-volatile radio frequency (RF) switch

A radio frequency (RF) switch includes a heating element and a thermally resistive material adjacent to sides of the heating element. A thermally conductive and electrically insulating material is situated on top of the heating element. A phase-change material (PCM) is situated over the thermally conductive and electrically insulating material. The PCM has an active segment overlying the thermally conductive and electrically insulating material, and passive segments underlying input/output contacts of the RF switch. The RF switch may include a bulk substrate heat spreader, a silicon-on-insulator (SOI) handle wafer heat spreader, or an SOI top semiconductor heat spreader under the heating element.

Radio frequency (RF) switches having phase-change material (PCM) and heat management for increased manufacturability and performance

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Irvine, CA, United States of America

David J Howard