Ifp Energies Nouvelles

Centre National De La Recherche Scientifique

Consejo Superior De Investigaciones Cientificas

Université Pierre Et Marie Curie (Paris 6)

Université Pierre Et Marie Curie

Scientifique, Universite Paris-sud 11

Institut Francais Du Pe'trole

David Grosso

Alexandra Chaumonnot

Clément Sanchez

Cédric Boissiere

Patrick Euzen

Clement Sanchez

Cedric Boissiere

Aurelie Coupe

Aurélie Coupe

Adrien Carretero-Genevrier

Marti Gich

Pierre Antoine Albouy

Stéphanie Pega

Cédric Boissière

The present invention relates to a process for preparing epitaxial &#x3b1;-quartz layers on a solid substrate, to the material obtained according to this process, and to the various uses thereof, especially in the electronics field.

Process for preparing an epitaxial alpha-quartz layer on a solid support, material obtained and uses thereof

A process for depositing a layer on at least part of the surface of a substrate by at least partially submerging the substrate in a solution having a solvent and at least one compound intended to form the layer, then drying the substrate, the drying being at least partially carried out in an atmosphere that is isolated from the solution. The submersion in the solution and the drying of the substrate are carried out in the same controlled-atmosphere enclosure.

Method for depositing a layer on the surface of a substrate

An inorganic material that consists of at least two elementary spherical particles, each of said spherical particles comprising metal nanoparticles that are between 1 and 300 nm in size and a mesostructured matrix with an oxide base of at least one element X that is selected from the group that consists of aluminum, titanium, tungsten, zirconium, gallium, germanium, tin, antimony, lead, vanadium, iron, manganese, hafnium, niobium, tantalum, yttrium, cerium, gadolinium, europium and neodymium is described, whereby said matrix has a pore size of between 1.5 and 30 nm and has amorphous walls with a thickness of between 1 and 30 nm, said elementary spherical particles having a maximum diameter of 10 &#x3bc;m. Said material can also contain zeolitic nanocrystals that are trapped within said mesostructured matrix.

Inorganic material that has metal nanoparticles that are trapped in a mesostructured matrix

The invention relates to a nanostructured porous oxyfluoride film deposited onto a substrate, to a method for its production, and also to various applications. The oxyfluoride has a porous semicrystalline structure and a refractive index of 1.08 to 1.25, measured in the visible range for a relative humidity level below 80%. Its chemical composition corresponds to the formula (MgCa)MFO(OH)M'in which n is the valency of M, n being 1 to 4, M represents at least one element chosen from Al, Si, Ge and Ga, M&#x2032; represents at least one element chosen from the group composed of Co, Cr, Ni, Fe, Cu, Sb, Ag, Pd, Cd, Au, Sn, Pb, Ce, Nd, Pr, Eu, Yb, Tb, Dy, Er and Gd, and 0&#x2266;w&#x3c;0.1; 0&#x2266;x&#x2266;1; 0&#x2266;y&#x2266;0.5; z&#x3c;1; z+t&#x3e;0 and t&#x3c;2.

Oxyfluoride in the form of a film and preparation method

A material with a hierarchical porosity is described, constituted by at least two spherical elementary particles, each of said spherical particles comprising zeolitic nanocrystals having a pore size in the range 0.2 to 2 nm and a matrix based on silicon oxide, which is mesostructured, having a pore size in the range 1.5 to 30 nm and having amorphous walls with a thickness in the range 1 to 20 nm, said spherical elementary particles having a maximum diameter of 10 &#x3bc;m. the matrix based on silicon oxide may contain aluminium. The preparation of said material is also described.

Material with a hierarchical porosity comprising silicon

A mesostructured aluminosilicate material is described, constituted by at least two spherical elementary particles, each of said spherical particles being constituted by a matrix based on silicon oxide and aluminum oxide, having a pore size in the range 1.5 to 30 nm, a Si/Al molar ratio of at least 1, having amorphous walls with a thickness in the range 1 to 20 nm, said spherical elementary particles having a maximum diameter of 10 &#x3bc;m. A process for preparing said material and its application in the fields of refining and petrochemistry are also described.

Mesostructured aluminosilicate material

A mesostructured material that consists of at least two elementary spherical particles, each of said particles comprising a mesostructured matrix based on aluminum oxide and having a pore size of between 1.5 and 30 nm, an aluminum oxide content that represents more than 46% by weight relative to the mass of said matrix, which has amorphous walls with a thickness of between 1 and 30 nm and whereby said elementary spherical particles have a maximum diameter of 10 &#x3bc;m, is described. Said mesostructured matrix can also contain silicon oxide. Each of the spherical particles of the mesostructured material can also contain zeolitic nanocrystals so as to form a material with a mixed porosity that is both mesostructured and zeolitic in nature. The preparation of said material is also described.

Mesostructured material with a high aluminum content

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David Grosso