Rohm and Haas Company

Rohm and Haas Electronic Materials Cmp Holdings, Inc.

David Goodro Kelly

Pu Luo

Yogesh Tiwary

James Keith Bardman

Michael Rhodes

James Charles Bohling

Mary Jo Kulp

Alan Isami Nakatani

Michael W Leonard

Adam Loyack

Michele Heffner

Donald A Winey

Kathleen A Auld

Martin Heuts

Huiling Yang

David Wayne Wolf

The present invention relates to a composition comprising an aqueous dispersion of multistage polymer particles comprising a first and a second phase, wherein the first phase comprises structural units of a carboxylic acid monomer or a salt thereof, and a nonionic ethylenically unsaturated monomer; and wherein the second phase comprises a first and second polymer, wherein the first phase or the second phase first polymer or both comprise structural units of a high Thydrophobic monomer; and wherein the second phase second polymer comprises at least 80 percent structural units of styrene. The high Thydrophobic monomer is defined as being one or more of the following monomers: cyclohexyl methacrylate, isobornyl methacrylate, 4-t-butyl methacrylate, t-butylstyrene, or n-butyl methacrylate. The multistage polymer particles are useful as opaque polymers, which are used in pigmented coating formulations to reduce the load of TiO. The particles exhibit excellent collapse resistance and unusually low dry bulk density, and do not require acrylonitrile to achieve this desired combination of properties.

Aqueous dispersion of multistage polymer particles

The present invention relates to a method of preparing an aqueous dispersion of multistage polymer particles comprising contacting under emulsion polymerization conditions and in a staged fashion an aqueous dispersion of carboxylic acid functionalized core polymer particles with first monomers and second monomers. The core comprises structural units of a high Thydrophobic monomer and/or the first monomers comprise a high Thydrophobic monomer, and the second monomers comprise at least 80 percent styrene. The high Thydrophobic monomer is cyclohexyl methacrylate, isobornyl methacrylate, 4-t-butyl methacrylate, t-butylstyrene, or n-butyl methacrylate, or a combination thereof. The multistage polymer particles are useful as opaque polymers, which are used in pigmented coating formulations to reduce the load of TiO. The particles exhibit excellent collapse resistance and unusually low dry bulk density, and do not require acrylonitrile to achieve this desired combination of properties.

Method for preparing an aqueous dispersion of multistage polymer particles

The present invention is a composition comprising a) an aqueous dispersion of TiOparticles encapsulated with an encapsulating acrylic or styrene-acrylic polymer comprising from structural units of diacetone acrylamide; and b) adipic acid dihydrazide. The composition is useful in coatings applications and shows a surprising improvement in gloss over compositions that do not include diacetone acrylamide functionalized encapsulating polymer and adipic acid dihydrazide.

Polymer encapsulated TiO2 coating formulation

The present invention relates to a process for preparing an aqueous dispersion of polymer encapsulated TiOparticles, comprising a multistage polymerization steps that includes a relatively large amount of low Tfirst monomers and a relatively small amount of high Tsecond monomers that comprise a relatively high concentration of an acid monomer. The dispersion of encapsulated TiOparticles shows significantly improved freeze-thaw stability as compared with prior art processes that do not include staging with the second monomers described herein.

[object Object]

The present invention relates to a pre-paint composite comprising an aqueous slurry of TiOparticles and a polymeric binder, wherein from 35 to 90 weight percent of the polymeric binder is attached to the TiOparticles, based on the weight of polymeric binder in the pre-paint composite. The pre-composite of the present invention is useful in paint compositions, particularly those that require freeze-thaw stability.

Freeze-thaw stable paint formulation

A process for encapsulating TiOparticles by polymerizing sodium styrene sulfonate with a redox initiator system; then polymerizing a first monomer mixture comprising at least 60 wt % acrylic monomers; then polymerizing a second monomer mixture comprising at least 40 wt % vinyl ester monomers.

Method of making polymer encapsulated titanium dioxide particles

The present invention relates to a pre-paint composite comprising an aqueous slurry of TiOparticles and attached and unattached polymeric binder, and a sufficient amount of a secondary alcohol ethoxylate of the formula CHO(CHCHO)H to give 35 to 90 weight percent attachment of polymeric binder to the TiOparticles, based on the weight of total polymeric binder in the pre-paint composite, where x is from 15 to 50; and the O(CHCHO)H group is bonded to a CH group on the CHchain. The present invention also relates to a coatings composition containing the composite as well as a process for preparing the pre-paint composite and the coatings composition.

The polishing pad is useful for polishing at least one of magnetic, optical and semiconductor substrates. The polishing pad includes a polishing layer having a polyurethane window. The polyurethane window has a cross-linked structure formed with an aliphatic or cycloaliphatic isocyanate and a polyol in a prepolymer mixture. The prepolymer mixture is reacted with a chain extender having OH or NHgroups and having an OH or NHto unreacted NCO stoichiometry less than 95%. The polyurethane window has a time dependent strain less than or equal to 0.02% when measured with a constant axial tensile load of 1 kPa at a constant temperature of 60&#xb0; C. at 140 minutes, a Shore D hardness of 45 to 90 and an optical double pass transmission of at least 15% at a wavelength of 400 nm for a sample thickness of 1.3 mm.

Creep-resistant polishing pad window

A chemical mechanical polishing pad is provided, comprising: a polishing layer having a polishing surface; and, a light stable polymeric endpoint detection window, comprising: a polyurethane reaction product of an aromatic polyamine containing amine moieties and an isocyanate terminated prepolymer polyol containing unreacted &#x2014;NCO moieties; and, a light stabilizer component comprising at least one of a UV absorber and a hindered amine light stabilizer; wherein the aromatic polyamine and the isocyanate terminated prepolymer polyol are provided at an amine moiety to unreacted &#x2014;NCO moiety stoichiometric ratio of &#x3c;95%; wherein the light stable polymeric endpoint detection window exhibits a time dependent strain of &#x2266;0.02% when measured with a constant axial tensile load of 1 kPa at a constant temperature of 60&#xb0; C. at 100 minutes and an optical double pass transmission of &#x2267;15% at a wavelength of 380 nm for a window thickness of 1.3 mm; and, wherein the polishing surface is adapted for polishing a substrate selected from a magnetic substrate, an optical substrate and a semiconductor substrate. Also provided is a method of polishing a substrate (preferably a semiconductor wafer) using the chemical mechanical polishing pad provided.

Chemical mechanical polishing pad with light stable polymeric endpoint detection window and method of polishing therewith

A foam comprising the reaction product of one or more multifunctional acrylates with one or more multifunctional aceto- or cyano-acetate compounds in the presence of a base and a blowing agent.

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Ambler, PA, United States of America

David Goodro Kelly