Veeco Instruments Inc.

David Gant

Ian Kunsch

Brett Stuart Snowden

Maria D Ferreira

Joseph Lamb

Gregory Williams

Ankit Modi

Aaron Frazier

Filter elements for gaseous fluid (e.g., air) filtration for wafer processing systems. The filter elements have a pleat ratio of no greater than 7, where the pleat ratio is the number of pleats per mean diameter of the filter. By having a pleat ratio no greater than 7, and in some implementations also greater than 5, the filter is optimized for wafer processing systems and methods. This pleat ratio optimizes the spacing between pleats, thus balancing filtration media area against effective area, such as what might be lost due to contaminant bridging.

Filter element for wafer processing assembly

A seal having a cross-sectional profile that includes a first lobe, a second lobe, and a corner having an angle between 45 and 90 degrees, inclusive, a first side extending from the first lobe to the corner and a second side extending from the second lobe to the corner, where the first side and the second side define the corner angle. The seal can be seated in a groove so that the first lobe and the corner are in the groove and the second lobe extends from the groove. In use, the second lobe folds into the groove to form a fluid-tight seal.

Seal for wafer processing assembly

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Somerset, NJ, United States of America

David Gant