Ultratech, Inc.

Ultratech Stepper, Inc.

Kla-tencor Technologies Corporation

David G Stites

Andrew M Hawryluk

Weijian Wang

Yu Chue Fong

Marian Mankos

Boris Grek

David J Walker

Salam Harb

Vassil Spasov

Izzy Lewis

Polarization-based coherent gradient-sensing systems and methods for measuring at least one surface-shape property of a specularly reflective surface are disclosed. The method includes: reflecting a first circularly polarized laser beam from a sample surface to form a second circularly polarized laser beam that contains surface-shape information; converting the second circularly polarized laser beam to a linearly polarized reflected laser beam; directing respective first and second portions of the linearly polarized reflected laser beam to first and second relay assemblies that constitute first and second interferometer arms. The first and second relay assemblies each use a pair of axially spaced-apart gratings to generate respective first and second interference patterns at respective first and second image sensors. Respective first and second signals from the first and second image sensors are processed to determine the at least one surface-shape property.

Polarization-based coherent gradient sensing systems and methods

A 1&#xd7; Wynne-Dyson optical system for microlithography having a variable magnification is disclosed. The 1&#xd7; Wynne-Dyson optical system has first and second prisms, and a positive lens group that includes a split lens having first and second split lens elements that reside adjacent the first and second prisms, respectively. The first and second split lens elements are axially movable to change the magnification by up to about 500 parts per million. An adjustable positive lens group for a 1&#xd7; Wynne-Dyson optical system is also disclosed, wherein the positive lens group allows for small changes in the optical system magnification.

Wynne-Dyson optical system with variable magnification

An LED-based photolithographic illuminator with high collection efficiency is disclosed. The illuminator utilizes an array of LEDs, wherein each LED has an LED die and a heat sink. The LED dies are imaged onto the input end of a homogenizer rod to substantially cover the input end without inclusion of the non-light-emitting heat sink sections of the LED. A microlens array is used to image the LED dies. The collection efficiency of the illuminator is better than 50% and the illumination uniformity at the output end of the light homogenizer is within +/&#x2212;2%.

LED-based photolithographic illuminator with high collection efficiency

A unit magnification Wynn-Dyson lens for microlithography has an image field sized to accommodate between four and six die of dimensions 26 mm&#xd7;36 mm. The lens has a positive lens group that consists of either three or four refractive lens elements, with one of the lens elements being most mirror-wise and having a prism-wise concave aspheric surface. Protective windows respectively reside between object and image planes and the corresponding prism faces. The lens is corrected for at least the i-line LED wavelength spectrum or similar LED-generated wavelengths.

Unit magnification large-format catadioptric lens for microlithography

One embodiment relates to an apparatus for inspecting a substrate using charged particles. The apparatus includes an illumination subsystem, an objective subsystem, a projection subsystem, and a beam separator interconnecting those subsystems. The apparatus further includes a detection system which includes a scintillating screen, a detector array, and an optical coupling apparatus positioned therebetween. The optical coupling apparatus includes both refractive and reflective elements. Other embodiments and features are also disclosed.

High-resolution, low-distortion and high-efficiency optical coupling in detection system of electron beam apparatus

A light tunnel ( ) comprising a hollow light tunnel body ( ) or a solid light tunnel body ( ) having a central axis (A1 or A2), a reflective surface ( or ) facing the axis, and an output end ( or ) having an edge ( or ) with a chamfered surface ( or ) formed on the edge. The chamfered surface is designed to alter the reflective properties of the reflective surfaces of the light tunnel body near the output end so as to reduce or eliminate edge ringing from the light tunnel body edge. In the case of a knife-edge ( ) placed at the output end of the light tunnel body, knife-edge ringing is eliminated by providing a light source ( ) in the form of a laser with a large number of spatial modes (M ). The present invention is expected to be most useful in cases where time-averaging or other interference-eliminating means prove impossible or impractical, such as with applications requiring only one or a few high-irradiance light pulses that need to uniformly irradiate a workpiece.

Apparatus for and method of reducing or eliminating interference effects in a light tunnel illuminator

An method of and apparatus ( ) for performing laser thermal processing (LTP) of a workpiece ( ) having one or more workpiece fields ( ). The apparatus includes a pulsed, solid state laser light source ( ) having more than 1000 spatial modes (M) and capable of emitting one or more pulses of radiation with a temporal pulse length between 1 nanosecond and 1 microsecond, a workpiece stage ( ) for supporting the workpiece, and an illumination optical system having an exposure field ( ). The system is arranged between the laser light source and the workpiece stage so as to illuminate within the exposure field at least one of the one or more workpiece fields with the one or more pulses of radiation, with an irradiance uniformity of less than &plusmn;5%. The method and apparatus is particularly well-suited for LTP processing of workpieces which require a single pulse or only a few pulses of high-irradiance radiation. Other applications of the present invention include rapid thermal annealing of semiconductor devices in semiconductor device manufacturing and processing, recording information in storage media, and, in general, conditioning surfaces.

Laser thermal processing apparatus and method

A light tunnel apparatus ( or ) having an output end ( or ), for uniformizing light (L) that travels through a light tunnel ( or ). The apparatus comprises a light tunnel having first and second sides ( or ), and one or more AO modulators ( or ) respectively arranged on at least one of the first and second sides. The AO modulators are arranged such that activating the one or more of them causes at least one of the first and second sides to be displaced. This displacement changes the path of light traveling through the light tunnel by an amount sufficient to reduce illumination non-uniformities at the output end. The light tunnel may be a hollow light tunnel ( ) with reflective inner surfaces, or a solid light tunnel ( ) with a refractive index. A method of uniformizing illumination using a light tunnel is also disclosed.

Acousto-optical light tunnel apparatus and method

A folded light tunnel apparatus and method of providing light with a high degree of spatial uniformity in a compact arrangement. The light tunnel (,) comprises plurality of prisms (,) having a different cross-sectional dimension (W) and at least one beveled end (,E) having a corresponding beveled end face (,F) through which light reflected by the beveled end passes. The plurality of prisms are arranged adjacent one another in a either two-dimensional or three dimensional stack, with each beveled end face arranged adjacent another beveled end face such that light reflected from one beveled end is received by said adjacent beveled end face and coupled into the adjacent prism. The width of the prisms is governed by a scaling factor (K or K&prime;) that depends on whether the prism stack is two-dimensional or three-dimensional. Designing the light tunnel according to the scaling factor allows for the light tunnel to be theoretically 100% efficient in the transmission of light.

Growing community of inventors

St. Petersburg, FL, United States of America

David G Stites