H.c. Starck Gmbh

David G Schwartz

Steven Alfred Miller

Gary Alan Rozak

Prabhat Kumar

Joseph Hirt

David Meendering

Brad Lemon

Timothy Welling

James G Daily, Iii

Jerome O'Grady

Rong-chein Richard Wu

In various embodiments, sputtering targets are formed by introducing molybdenum powder into a sheet bar mold, pressing the powder to form a sheet bar, sintering the sheet bar to form an ingot having a density of at least 90% of a theoretical density, preheating the ingot, rolling the ingot to form a plate, and heat treating the plate.

Methods of forming molybdenum sputtering targets

In various embodiments, tubular sputtering targets comprising molybdenum are provided and sputtered to produce thin films comprising molybdenum. The sputtering targets may be formed by forming a tubular billet having an inner diameter IDand an outer diameter OD, the formation comprising pressing molybdenum powder in a mold and sintering the pressed molybdenum powder, working the tubular billet to form a worked billet having an outer diameter ODsmaller than OD, and heat treating the worked billet. The sputtering targets may have a substantially uniform texture of (a) a 110 orientation parallel to a longitudinal direction and (b) a 111 orientation parallel to a radial direction.

Methods of depositing thin films using molybdenum sputtering targets

In various embodiments, planar sputtering targets are produced by forming a billet at least by pressing molybdenum powder in a mold and sintering the pressed powder, working the billet to form a worked billet, heat treating the worked billet, working the worked billet to form a final billet, and heat treating the final billet.

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Mentor, OH, United States of America

David G Schwartz