Alzeta Corporation

David Frederick Bartz

Robert M Kendall

Frederick E Moreno

Martin G Carswell

Michael J Silberstein

The present disclosure generally relates to systems and methods for the combustive abatement of waste gas formed during the manufacture of semiconductor wafers. In particular, the systems described herein are capable of combusting air-polluting perfluorocarbons, including those having high greenhouse gas indexes such as hexafluoroethane (CF) and tetrafluoromethane (CF), as well as particulate-forming silicon dioxide precursors, such as silane (SiH) and tetraethoxysilane (Si(OCH), abbreviated TEOS), with greater efficiency and lower energy usage than prior abatement systems. More particularly, and in one preferred embodiment, the present disclosure is directed to a waste gas abatement system that utilizes a combination of non-combustible and combustible gases (or gas mixtures) for thermal combustion, which are directed through multiple permeable interior surfaces of a reaction chamber, efficiently combusting waste gas and preventing undesirable accumulation of solid particulate matter on the chamber surfaces.

Systems and methods for improved waste gas abatement

The disposal of troublesome substances, especially global-warming halogenated compounds is difficult enough, but is particularly difficult when associated with particulate-forming matter, such as silane and arsine commonly encountered in waste gas streams of the semiconductor industry. The combustive destruction of the troublesome substances in such a waste gas stream is simply and successfully achieved by injecting the stream admixed with fuel gas into a combustion zone surrounded by the radiant surface of a foraminous gas burner that is separately fed fuel gas and excess air sufficient to burn all the combustibles entering the combustion zone. A simple apparatus integrates the combustion zone with a quenching zone for the combustion product stream.

Apparatus for combustive destruction of troublesome substances

Combustive destruction of halogenated compounds

A water heater of simplified construction which incorporates a unique infrared gas burner performs with notable thermal efficiency and suppression of the combustion pollutants, nitrogen oxides. The upright cylindrical water tank of the new water heater is supported by a cylindrical metal skirt having the same diameter of the tank. A circular perforated ceramic plate is fitted transversely in the skirt to provide a combustion zone above it and a plenum for fuel gas and air below it. A venturi tube extends through the skirt into the plenum for the injection of gas and air. The flameless combustion occurring at the exit surface of the perforated plate makes it a radiant emitter of infrared energy aimed at the bottom of the water tank.

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San Jose, CA, United States of America

David Frederick Bartz