Unaxis-balzers Aktiengesellschaft

David Franz

Johann Karner

Mauro Pedrazzini

Christoph Hollenstein

The present invention relates to a method for diamond coating of substrates in which the substrate is exposed in a vacuum atmosphere to a reactive gas mixture excited by means of a plasma discharge, the plasma discharge comprising a plasma beam () in an evacuated receiver () that is formed between a cathode chamber () and an anode (), and the reactive gas mixture comprising a reactive gas and a working gas, the reactive gas in () and the working gas in () and/or () introduced into the receiver, and the receiver () is evacuated by a pump arrangement (), and the hydrogen concentration of the reactive gas mixture being 0&#x2013;45 vol. %.

Method for diamond coating substrates

Method for coating workpieces generates a beam of a plasma in an evacuated container. A region of highest plasma density is at the beam axis and workpieces having surfaces to be coated, are radially offset from, and extend along the axis with the surfaces facing the axis and being in the container. Fresh reactive gas is inlet into the container and consumed gas is removed from the container. Coating material is deposited upon the surfaces with a deposition rate of at least 400 nm/min and at a maximum temperature of the surfaces being 550&deg; C.

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Sevelen, Switzerland

David Franz