Hughes Aircraft Company

David E Snyder

James D Parsons

A semiconductor device component, and process for preparation thereof, wherein current flowing in a vertical channel of semiconductor material is controlled by metallic gates laterally disposed on either side of the channel. Insulator layers are positioned overlying and underlying each gate, to reduce parasitic capacitance which would otherwise be present if the metallic gate material were in contact with overlying and underlying semiconductor material. Reduction of the capacitance allows the use of wider gate strips, thereby reducing the series resistance to an external gate contact. These changes significantly improve the high-power, high-frequency performance of the device component, as compared with permeable base transistors.

Vertical channel field effect transistor

The present invention provides a circuit comprising (1) a logic element responsive to data of first and second negative voltage potentials, the logic element having a depletion mode MESFET data input gate, and (2) a depletion mode MESFET transmission gate operatively associated with the data input gate for enabling the selective serial transmission of data therethrough to the logic element in response to clock signals of third and fourth negative voltage potentials, the pinch-off threshold voltage of the data input gate being between approximately the first and second negative voltage potentials, the pinch-off threshold voltage of the transmission gate being between approximately the third and fourth negative voltage potentials, said third negative voltage potential being approximately equal to or more negative than said second negative voltage potential, said first negative voltage potential being more positive than said second negative voltage potential, and said fourth negative voltage potential being more negative than said third negative voltage potential.

Growing community of inventors

Seattle, WA, United States of America

David E Snyder