Kla Tencor Corporation

Kla Corporation

David Craig Oram

Kenong Wu

Eugene Shifrin

Abhinav Mathur

Jeremy Nesbitt

Jagadeesh Kumar

A system, method, and non-transitory computer readable medium are provided for tuning sensitivities of, and determining a process window for, a modulated wafer. The sensitivities for dies of the modulated wafer are tuned dynamically based on a single set of parameters. Further, the process window is determined for the modulated wafer from prior determined parameter-specific nominal process windows.

System, method and non-transitory computer readable medium for tuning sensitivities of, and determining a process window for, a modulated wafer

A system which may be used to increase the number of available spectrum bands in an inspection system is provided. The system may include an illumination source configured to emit broadband illumination. The system may also include a filter assembly including two or more filter units. The two or more filter units may include two or more filters with one or more varying filtering characteristics. The system may also include two or more motors configured to selectively actuate selected filters of the filter units into the beam of illumination. Using the system, the number of available spectrum bands to be used in an inspection system may be increased.

Filter assembly for providing adjustable spectral capabilities in a broadband inspection system

System, method and non-transitory computer readable medium for tuning sensitivies of, and determining a process window for, a modulated wafer

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Fremont, CA, United States of America

David Craig Oram