Asml Netherlands B.v.

David Christopher Ockwell

Antonius Theodorus Anna Maria Derksen

Cheng-Qun Gui

Han-Kwang Nienhuys

Bernardus Antonius Johannes Luttikhuis

Noud Jan Gilissen

Kursat Bal

Arnold Jan Van Putten

Erik Marie José Smeets

Henricus Jozef Peter Lenders

Gabriel Nicolaas Martinus Maria Van Der Voort

Maikel Bernardus Theodorus Leenders

A lithographic apparatus injects gas between a reticle (MA) and reticle blades (REB-X, REB-Y) to protect the reticle from contamination. The gas may be injected either into the space defined between the reticle and the closest pair of reticle blades, or into the space defined between the two pairs of reticle blades.

Lithographic apparatus

A substrate support is provided for a lithographic apparatus. The support comprises a substrate table constructed to hold a substrate and a chuck for the substrate table. In operation, the substrate table is supported by the chuck and clamped thereto. The substrate support comprises a first set of burls on a surface of the support block for abutting against the substrate table during the clamping and a second set of burls on a surface of the substrate table for abutting against the support block during the clamping.

Lithographic apparatus and device manufacturing method

A masking apparatus for preventing irradiation of an outer region of a substrate during lithography is disclosed. The masking apparatus includes a mask that includes a plurality of discrete segments arranged to form a continuous ring shaped mask positioned between an outer region of a substrate and an illumination system.

A method for locating, forming, or both locating and forming, bumps of material on a substrate having a plurality of devices, the method includes receiving data which indicates the number and location of the devices on the substrate, then using a flip-chip bumping apparatus to locate, form, or both locate and form, bumps of material on the devices, the positions of the devices being determined using the data.

Method and apparatus for locating and/or forming bumps

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Waalre, Netherlands

David Christopher Ockwell