Asml Netherlands B.v.

David Christopher Christopher Ockwell

Johannes Onvlee

Reinder Teun Plug

Paul Jacques Van Wijnen

Hubert Marie Segers

Suzan Leonie Auer-Jongepier

A lithographic apparatus configured to transfer a pattern from a patterning device onto a substrate includes an integrated post-exposure bake device, the post-exposure bake device configured to subject the substrate to a predefined temperature cycle. A post-exposure bake step of the substrate (a temperature cycle) is executed within a predetermined time period after the transfer of the pattern. The lithographic apparatus may be combined with a processing system having one or more processing modules. More efficient use may be made of the combination, allowing flexibility for a device manufacturing method.

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Waalre, Netherlands

David Christopher Christopher Ockwell