Texas Instruments Corporation

David C Hall

Mark H Somervell

Benjamen M Rathsack

Juanita G Miller

The present invention provides a blended solvent for solubilizing an ultraviolet photoresist. The blended solvent comprises a mixture of from about 5 vol % to about 95 vol % of a first solvent, wherein the first solvent comprises a cyclic ester. A balance of the mixture comprises a second solvent, wherein the second solvent comprises a volatile organic liquid.

Use of blended solvents in defectivity prevention

The invention provides methods and apparatus for drying the backside of semiconductor wafers in a spin-coating environment. Solvent is evaporatively dried from a semiconductor wafer held in a spin mechanism. The undried wafer is sprayed with one or more jets of pressurized gas from gas ports disposed about the spin mechanism.

Method and system for drying semiconductor wafers in a spin coating process

A method for spin coating high viscosity materials. Two dispense steps are used. The first dispense step dispenses a small amount ( ) of high viscosity material at the center of the wafer ( ). A high-speed wafer rotation spreads the material to form a thin layer ( ) to prime the surface of the wafer ( ) and lower the surface tension without regard to uniformity. A second dispense step occurs at lower RPM and coats ( ) the wafer ( ) more uniformly.

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Murphy, TX, United States of America

David C Hall