Asml Netherlands B.v.

Amsl Netherlands B.v.

David Bessems

Marco Koert Stavenga

Erik Henricus Egidius Catharina Eummelen

Sergei Shulepov

Cornelius Maria Rops

Koen Steffens

Samuel Bertrand Dominique David

Rogier Hendrikus Magdalena Cortie

Matheus Anna Karel Van Lierop

Michel Riepen

Jon David Tedrow

Ronald Van Der Ham

Giovanni Luca Gattobigio

Jimmy Matheus Wilhelmus Van De Winkel

Fabrizio Evangelista

Clemens Johannes Gerardus Van Den Dungen

Victor Manuel Blanco Carballo

Marcus Johannes Van Der Zanden

Dirk De Vries

Marcus Theodoor Wilhelmus Van Der Heijden

Patrick Wong

Walter Theodorus Matheus Stals

Frederik Antonius Van Der Zanden

Wilhelmus Antonius Wernaart

Colin Michael Odneal

Paul Willems

Frederik Johannes Van Den Bogaard

Jacques Roger Alice Mycke

Johannes Catharinus Hubertus Mulkens

Nicolaas Ten Kate

Martinus Hendrikus Antonius Leenders

Nicolaas Rudolf Kemper

Nina Vladimirovna Dziomkina

Paulus Martinus Maria Liebregts

Marinus Jochemsen

Marco Baragona

Laurentius Johannes Adrianus Van Bokhoven

Takeshi Kaneko

Richard Moerman

Daniel Jozef Maria Direcks

Danny Maria Hubertus Philips

Pieter Mulder

Gert-Jan Gerardus Johannes Thomas Brands

Pieter Lein Joseph Gunter

Jan Willem Cromwijk

Adrianes Johannes Baeten

Sandra Van Der Graaf

Hua Li

Mathieus Anna Karel Van Lierop

Maikel Adrianus Cornelis Schepers

Erik Witberg

Tijmen Wilfred Mathijs Gunther

Ralph Joseph Meijers

Adrianus Marinus Verdonck

Franciscus Wilhelmus Bell

Marcus Agnes Johannes Smits

Zhenhua Ma

Wei-Hsun Chen

A substrate table for an immersion lithographic apparatus is disclosed having a recess, configured to receive a substrate of a given size, and a fluid extraction system, configured to extract fluid from a gap between the edge of the substrate and the edge of the recess, the fluid extraction system configured such that the rate of flow of fluid extracted from a localized section of the gap is greater than the rate of flow of fluid extracted from another section of the gap.

Substrate table, immersion lithographic apparatus and device manufacturing method

A conduit suitable for use in a high temperature, high pressure environment, the conduit having an elongate portion made of a first refractory metal and a fitting portion made of a second refractory metal attached to an axial end of the elongate portion. The attachment may be made by welding and the second refractory metal may have a greater yield strength than the first refractory metal.

Apparatus for high pressure connection

A coupling arrangement including a first fitting, a second fitting, and a rotational coupler which when turned presses the first fitting against the second fitting, in which the fittings engage rotationally to inhibit relative rotation of the fittings. For example, one of the fittings may have protrusions and the other fitting may have recesses arranged to receive the protrusions.

Anti-rotation coupling

A fluid handling structure for a lithographic apparatus configured to contain immersion fluid to a region, the fluid handling structure having, at a boundary of a space: at least one gas knife opening in a radially outward direction of the space; and at least one gas supply opening in the radially outward direction of the at least gas knife opening relative to the space. The gas knife opening and the gas supply opening both provide substantially pure COgas so as to provide a substantially pure COgas environment adjacent to, and radially outward of, the space.

Fluid handling structure, a lithographic apparatus and a device manufacturing method

A vessel having a seal that is protected from the liquid material within the vessel by a volume of gas. The vessel has a partition that divides the vessel into two volume spaces such that the seal that is in gaseous communication with the first volume space is protected from the liquid material in the second volume space by a volume of gas in the first volume space.

Methods and apparatuses for protecting a seal in a pressure vessel of a photolithography system

A fluid handling structure for a lithographic apparatus has, at a boundary of a space configured to contain immersion fluid to a region external to the fluid handling structure, a gas supply opening radially outward of the space, a fluid recovery opening radially outward of the gas supply opening, and a damper surface extending at least 0.5 mm radially outwards from the fluid recovery opening along the undersurface of the fluid handling structure.

A fluid handling structure for a lithographic apparatus, the fluid handling structure successively having, at a boundary from a space configured to comprise immersion fluid to a region external to the fluid handling structure: an extractor having at least one opening arranged in a first line that, in use, is directed towards a substrate and/or a table; and a liquid manipulator on a surface that, in use, faces the substrate and/or table to reduce the chance of droplets on the surface from coalescing.

Fluid handling structure, lithographic apparatus and device manufacturing method

In a liquid confinement structure of an immersion lithographic apparatus an elongate continuous opening forms an outlet for supplying liquid to a space beneath the projection system. The elongate slit forms a region of high shear and pressure gradient that deflects bubbles away from the image field.

Lithographic apparatus and a device manufacturing method involving an elongate liquid supply opening or an elongate region of relatively high pressure

A fluid handling structure for a lithographic apparatus, the fluid handling structure having, at a boundary of a space configured to contain immersion fluid to a region external to the fluid handling structure: a meniscus pinning feature to resist passage of immersion fluid in a radially outward direction from the space; a gas supply opening at least partly surrounding and radially outward of the meniscus pinning feature; and optionally a gas recovery opening radially outward of the gas supply opening, wherein the gas supply opening, or the gas recovery opening, or both the gas supply opening and the gas recovery opening, has an open area per meter length which has a variation peripherally around the space.

A fluid handling structure for a lithographic apparatus, the fluid handling structure having, at a boundary from a space configured to contain immersion fluid to a region external to the fluid handling structure: a meniscus pinning feature to resist passage of immersion fluid in a radially outward direction from the space; a gas supply opening radially outward of the meniscus pinning feature; and a gas recovery opening radially outward of the meniscus pinning feature and at least partly surrounding the gas supply opening.

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Eindhoven, Netherlands

David Bessems