Rohm & Haas Electronic Materials LLC

Other

Globalfoundries Inc.

Shipley Company LLC

International Business Machines Corporation

David A Valeri

James F Cameron

James W Thackeray

Suzanne M Coley

Vipul Jain

Paul J LaBeaume

Amy M Kwok

John Paul Amara

Jin Wuk Sung

Greogory P Prokopowicz

Wu-Song S Huang

Pushkara Rao Varanasi

Wenjie Li

Gregory P Prokopowicz

Libor Vyklicky

Robert D Mikkola

Irene Popova

Robert A Binstead

Osnat Younes-Metzler

Irene Y Popova

Organic coating compositions, particularly antireflective coating compositions, are provided that comprise that comprise a diene/dienophile reaction product. Preferred compositions of the invention are useful to reduce reflection of exposing radiation from a substrate back into an overcoated photoresist layer and/or function as a planarizing, conformal or via-fill layer.

Coating compositions suitable for use with an overcoated photoresist

Organic coating compositions, particularly antireflective coating compositions, are provided that can be developed with an aqueous alkaline developer, including in a single step during development of an overcoated photoresist layer. Preferred coating compositions comprise a tetrapolymer that comprises at least four distinct functional groups.

A polymer includes repeat units, most of which are photoacid-generating repeat units. Each of the photoacid-generating repeat units includes photoacid-generating functionality and base-solubility-enhancing functionality. Each of the photoacid-generating repeat units comprises an anion and a photoacid-generating cation that collectively have structure (I) wherein q, r, R, m, X, and Zare defined herein. The polymer is useful as a component of a photoresist composition that further includes a second polymer that exhibits a change in solubility in an alkali developer under action of acid.

Polymer comprising repeat units with photoacid-generating functionality and base-solubility-enhancing functionality, and associated photoresist composition and electronic device forming method

A photoresist composition includes a first polymer in which at least half of the repeat units are photoacid-generating repeat units, and a second polymer that exhibits a change in solubility in an alkali developer under the action of acid. In the first polymer, each of the photoacid-generating repeat units comprises photoacid-generating functionality and base-solubility-enhancing functionality.

Photoresist composition and associated method of forming an electronic device

A polymer includes repeat units, at least half of which are photoacid-generating repeat units. Each of the photoacid-generating repeat units includes photoacid-generating functionality and base-solubility-enhancing functionality. The polymer is useful as a component of a photoresist composition that further includes a second polymer that exhibits a change in solubility in an alkali developer under action of acid.

A counter electrode for use in an electrochemical cell suitable for analysis of an electroplating composition, the counter electrode comprising a conductor; a sheath disposed about the conductor; an electrolyte disposed within the sheath; and an optionally porous element on the sheath, the porous element providing signal communication between the electrolyte and an analyte.

Electrode, electrochemical cell, and method for analysis of electroplating baths

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Leominster, MA, United States of America

David A Valeri