Advanced Micro Devices Corporation

David A Steele

Ramkumar Subramanian

Khoi A Phan

Jonathan Alan Orth

Richard J Bartlett

Anthony P Coniglio

Gurjeet S Bains

A remote track editor system, method, and computer readable medium is provided to remotely edit track flows and recipes of semiconductor processing tools. The editor system includes a processing track, a track controller, and a remote track editor for remotely editing recipes of at least one semiconductor processing tool. The editor system communicates with remote terminals and accesses multiple flows and recipes stored on network databases through a SECS/GEM interface. The remote track editor edits recipes without interrupting the process track and correctly renumbers line and flow numbers of the recipes when editing, deleting, or inserting steps. The remote track editor also performs side-by-side comparisons of multiple recipes, verifies the contents of recipes to master recipes, and provides indicators of mismatches.

Remote wafer flow and recipe editor for simiconductor processing control

An arrangement for optimizing a lithographic process forms a pattern on a silicon wafer using a photocluster cell system to simulate an actual processing condition for a semiconductor product. The resist pattern is then inspected using a wafer inspection system. An in-line low voltage scanning electron microscope (SEM) system reviews and classifies defect types, enabling generation of an alternative processing specification. The alternative processing specification can then be tested by forming patterns on different wafers, and then performing split-series testing to analyze the patterns on the different wafers for comparison with the existing lithographic process and qualification for production.

Apparatus and method for reducing defects in a semiconductor lithographic process

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San Jose, CA, United States of America

David A Steele