Veeco Instruments Inc.

Bruker Nano Gmbh

David A Kneeburg

Rohit Jain

Jason Osborne

Matthew Klonowski

Wei Yao

Ingo Schmitz

Jason R Osborne

Matthew T Klonowski

The preferred embodiments are directed to a method and apparatus of operating a scanning probe microscope (SPM) to perform sample measurements using a survey scan that is less than five lines, and more preferably two lines, to accurately locate a field of features of a sample. This is accomplished by selecting a step distance between adjacent lines of the survey scan that does not equal the pitch of the features in a direction orthogonal to the direction the survey scan traverses, i.e., does not equal the pitch of the features in the scan direction, X. The aspect ratio of the scans can also be modified to further improve sample throughput.

Scanning probe microscopy method and apparatus utilizing sample pitch

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Santa Barbara, CA, United States of America

David A Kneeburg