Kla-tencor Technologies Corporation

Ict Integrated Circuit Testing Gesselschaft

David A Crewe

Juergen Frosien

Stefan Lanio

Alan D Brodie

Chiyan Kuan

David Aitan Soltz

John M Schmidt

Edward Michael James

Gerald Schoenecker

Roger L Kroeze

Gregory W Grant

Thierry H C Nguyen

Salvatore T Fahey

The present invention relates to a charged particle unit for deflecting and energy-selecting charged particles of a charged particle beam. Thereby, a double-focusing sector unit for deflecting and focusing the charged particle beam and an energy-filter forming a potential is provided, whereby charged particles of the charged particles beam are redirected at the potential-saddle depending on the energy of the charged articles.

High current density particle beam system

One embodiment disclosed relates to a charged-particle beam apparatus configured with sample charging control. A stage is configured to hold a sample, and a column for generating a charged-particle beam and for directing the beam to an area of the sample. A light beam is generated by an irradiation source and is directed to the area. Bias circuitry is configured to apply a stage bias voltage such that an electric field is created with respect to the sample. Control circuitry is coupled to the irradiation source and to the bias circuitry. The control circuitry is configured to direct the light beam onto the area at a same time as the stage bias voltage is applied to the sample. Other embodiments are also disclosed.

Sample charging control in charged-particle systems

A method of measuring properties of a sample using an electron beam. Coordinates of a measurement site on the sample, and a diameter of the electron beam are defined. Multiple measurement locations are determined within the measurement site, using the coordinates of the measurement site and the diameter of the electron beam. The measurement locations are selected such that the electron beam when directed at the multiple measurement locations (either through beam deflection or sample movement) substantially covers the measurement site. The electron beam is directed to the measurement locations and properties of the sample are measured at each of the measurement locations.

Site stepping for electron beam micro analysis

Growing community of inventors

Sunnyvale, CA, United States of America

David A Crewe