Lam Research Corporation

Dave Jacob

Andreas Fischer

Harlan I Halsey

Methods and apparatus for plasma processing of a substrate to improve process results are proposed. The apparatus pertains to multi-layer segmented electrodes and methods to form and operate such electrodes. The multi-layer segmented electrode includes a first layer comprising a first plurality of electrode segments, whereby electrode segments of the first plurality of electrode segments spatially separated from one another along a first direction. There is also included a second layer comprising a second plurality of electrode segments, whereby the second layer is spatially separated from the first layer along a second direction perpendicular to the first direction and whereby at least two segmented electrodes of the first plurality of electrode segments are individually controllable with respect to one or more electrical parameters.

Plasma processing systems having multi-layer segmented electrodes and methods therefor

The present invention provides a diffuser and a chamber for venting and/or pumping gas. The diffuser includes a body, a reflector, and a set of vanes. The body includes a nozzle through a center portion and has a curved surface on an upper side to define an open space above the curved surface. The nozzle is arranged to allow a gas to flow through and expand in the nozzle. The reflector is disposed over the nozzle and is arranged to reflect the gas from the nozzle into the open space in the body while expanding the gas flow. The vanes further divide the flow into roughly equal portions. In this configuration, the flow of the gas is slowed in the nozzle, the reflector portion, and the open space in the body between the vanes so that the gas flows out of the open space with substantially uniform low velocity.

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Fremont, CA, United States of America

Dave Jacob