Asml Netherlands B.v.

Dave Braaksma

Christiaan Alexander Hoogendam

Peter Michel Silvester Maria Heijmans

Maarten Hartger Kimman

Hans Butler

Wilhelmus Franciscus Johannes Simons

Maurice Willem Jozef Etiënne Wijckmans

Martinus Van Duijnhoven

Hendrikus Herman Marie Cox

René Wilhelmus Antonius Hubertus Leenaars

Stephan Christiaan Quintus Libourel

An electromagnetic motor is described, the electromagnetic motor comprising: a magnet assembly configured to generate a two-dimensional alternating magnetic field having a pitch Pmin a first direction and a pitch Pmin a second direction; a coil assembly configured to co-operate with the magnet assembly to generate a first force in the first direction and a second force in the second direction, wherein the coil assembly comprises a first coil set comprising a plurality of first coils for generating the first force and a second coil set comprising a plurality of second coils for generating the second force, wherein a ratio Rof a coil pitch Pcin the first coil set in the first direction over Pmis different from a ratio Rof a coil pitch Pcin the second coil set in the second direction over Pm

Multiphase linear motor, multiphase planar motor, stage, lithographic apparatus and device manufacturing method

An electromagnetic motor is described, the electromagnetic motor comprising: a magnet assembly configured to generate a two-dimensional alternating magnetic field having a pitch Pmin a first direction and a pitch Pmin a second direction; a coil assembly configured to co-operate with the magnet assembly to generate a first force in the first direction and a second force in the second direction, wherein the coil assembly comprises a first coil set comprising a plurality of first coils for generating the first force and a second coil set comprising a plurality of second coils for generating the second force, wherein a ratio R1 of a coil pitch Pcin the first coil set in the first direction over Pmis different from a ratio R2 of a coil pitch Pcin the second coil set in the second direction over Pm

The present invention relates to a positioning system, including: a first actuator to exert an actuation force on a moveable body, the first actuator being coupled to a balance mass configured to absorb a reaction force resulting from the actuation force, the actuation force providing an acceleration of the moveable body and the reaction force providing an acceleration of the balance mass, wherein a force resulting from the acceleration of the moveable body together with a force resulting from the acceleration of the balance mass result in a balance mass torque; a balance mass support to support the balance mass onto a frame, which balance mass support engages the frame at a support position; and a torque compensator; wherein the torque compensator exerts a compensation force to compensate the balance mass torque, and wherein the torque compensator exerts the compensation force on the frame at the support position.

Positioning device, lithographic apparatus, method for compensating a balance mass torque and device manufacturing method

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Veldhoven, Netherlands

Dave Braaksma