Edwards Limited

The Boc Group, Inc.

Darren Mennie

Ron C Lee

Nicholas Benjamin Jones

Colin Michael Harrison

Joanne Rachel Greenwood

Andrew James Seeley

Barrie Dudley Brewster

Christopher Mark Bailey

Duncan Michael Price

Gary Peter Knight

Robert Bruce Grant

Michael Roger Czerniak

Derek Martin Baker

Ingo Stephen Graham

Clive Marcus Lloyd Tunna

Jack Raymond Tattersall

Makoto Kaneko

Dry pumps are used to pump a variety of gas mixtures from the semiconductor industry. The present invention provides a liquid ring pump located between the dry pump and an abatement device to remove soluble corrosive materials prior to the exhaust gases entry to the abatement device, the work fluid exhausted from the liquid ring pump being separated from the gas prior to entry to the abatement device.

Apparatus for evacuating a corrosive effluent gas stream from a processing chamber

Apparatus is described for combusting exhaust gases output from a plurality of process chambers. The apparatus comprises a plurality of exhaust gas combustion nozzles () connected to a combustion chamber (). Each nozzle receives a respective exhaust gas (), and comprises means for receiving a fuel () and an oxidant () for use in forming a combustion flame within the chamber. A controller receives data indicative of the chemistry of the exhaust gas supplied to each nozzle, and adjusts the relative amounts of fuel and oxidant supplied to each nozzle in response to the received data. This can enable the nature of each combustion flame to be selectively modified according to the nature of the exhaust gases to be destroyed by that flame, thereby enhancing the destruction rate efficiency of the exhaust gas and optimising fuel consumption.

Gas combustion apparatus

A method of combusting ammonia is described, in which an exhaust gas containing varying amounts of at least ammonia and hydrogen is conveyed from a chamber to a combustion nozzle () connected to a combustion chamber (). A combustion gas for forming a combustion flame within the chamber is supplied to the chamber. Depending on the relative amounts of ammonia and hydrogen exhaust from the chamber, hydrogen is added to the exhaust gas so that, when the exhaust gas contains ammonia, the gas combusted by the flame contains at least a predetermined amount of hydrogen.

Apparatus for producing liquid or solid xenon comprises a ducthaving an inletfor receiving gaseous xenon and an outletfor outputting gaseous xenon at a reduced temperature to a nozzle located in a vacuum chamber. A housingextends about the duct and contains a halocarbon coolant in thermal contact with the duct, and a second ductin thermal contact with the halocarbon coolant for conveying a flow of liquid nitrogen through the housingto control the temperature of the halocarbon. In view of the difference in the pressure of the xenon gas output from the duct and the pressure in the chamber, the thus-cooled gas is caused to liquefy or solidify in the vicinity of the nozzle.

System for liquefying or freezing xenon

A vacuum pumping system comprises a first gas supply for supplying a first gas, such as xenon, to a vacuum chamber. A pump receives the gas output from the chamber. A second gas supply supplies a purge gas, such as nitrogen or helium, for pumping with the first gas. A gas separator receives the pumped gases exhausted by the pump, and recovers the first gas and the purge gas from the stream. The recovered first gas is recirculated through the vacuum chamber, and the recovered second gas is recirculated through at least the pump.

Vacuum pumping system

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Portishead, United Kingdom

Darren Mennie