Hughes Aircraft Company

Hughes Electronics Corporation

Darrell A Gleichauf

Weldon S Williamson

Barret Lippey

Edward S Di Milia

Thomas E Whiting

Cryofilm/organic contaminants are removed from cryogenically cooled surfaces such as spacecraft cryo-telescope mirrors by sputtering and chemical reaction with a low energy plasma having an average ion energy of not more than about 30 eV, and preferably in the approximate range of 5-20 eV. When the reactive plasma's freezing point is higher than the temperature of the surface to be cleaned, the cryofilm and embedded hydrocarbons are first removed with a non-reactive plasma having a freezing point less than the surface temperature, the reactive plasma is then used to remove residual organic contaminants left on the surface by chemical reaction, and finally another inert plasma is applied to remove reactive plasma frozen to the surface; the two inert plasmas are preferably formed from the same gas.

Low energy plasma cleaning method for cryofilms

A system for monitoring changes in the amount of contaminants present in a flowing stream of supercritical fluid. A sample stream is removed from a flowing stream of supercritical fluid and subjected to reduced pressure. The supercritical fluid turns into gas at the reduced pressure with the contaminants remaining in a non-gaseous form. A quartz crystal microbalance system measures changes in the amount of non-gaseous contaminants present in the sample stream. The system is useful in monitoring both cleaning processes and extraction processes utilizing supercritical fluids.

Growing community of inventors

Redondo Beach, CA, United States of America

Darrell A Gleichauf