Asml Netherlands B.v.

Danying Li

Youping Zhang

Chi-Hsiang Fan

Jay Jianhui Chen

Abdalmohsen Elmalk

Kui-Jun Huang

A method for determining a stack configuration for a substrate subjected to a patterning process. The method includes obtaining (i) measurement data of a stack configuration with location information on a printed substrate, (ii) a substrate model configured to predict a stack characteristic based on a location of the substrate, and (iii) a stack map including a plurality of stack configurations based on the substrate model. The method iteratively determines values of model parameters of the substrate model based on a fitting between the measurement data and the plurality of stack configurations of the stack map, and predicts an optimum stack configuration at a particular location based on the substrate model using the values of the model parameters.

Growing community of inventors

Shenzhen, China

Danying Li