Asml Netherlands B.v.

Axxicon Moulds Eindhoven B.v.

Danny Maria Hubertus Philips

Clemens Johannes Gerardus Van Den Dungen

Daniel Jozef Maria Direcks

Pieter Mulder

Nicolaas Rudolf Kemper

Paulus Martinus Maria Liebregts

Koen Steffens

Johannes Catharinus Hubertus Mulkens

Martinus Hendrikus Antonius Leenders

Michel Riepen

Erik Henricus Egidius Catharina Eummelen

Marcel Beckers

Cédric Désiré Grouwstra

Richard Moerman

Paul Petrus Joannes Berkvens

Evert Van Vliet

Maikel Adrianus Cornelis Schepers

Nicolaas Franciscus Koppelaars

Arnold Jan Van Putten

Remko Jan Peter Verhees

Sjoerd Nicolaas Lambertus Donders

Franciscus Johannes Joseph Janssen

Jan Bernard Plechelmus Van Schoot

Han-Kwang Nienhuys

Leon Martin Levasier

Yuri Johannes Gabriël Van De Vijver

Marcio Alexandre Cano Miranda

Martinus Agnes Willem Cuijpers

Fabrizio Evangelista

Manish Ranjan

Roger Wilhelmus Antonius Henricus Schmitz

Adrianes Johannes Baeten

Oleg Voznyi

Marcus Johannes Van Der Zanden

Alain Louis Claude Leroux

Albert Pieter Rijpma

Kursat Bal

Oleksiy Galaktionov

Nicolaas Ten Kate

Johannes Petrus Martinus Bernardus Vermeulen

Ronald Van Der Ham

Wilhelmus Franciscus Johannes Simons

Laurentius Johannes Adrianus Van Bokhoven

David Bessems

Han Henricus Aldegonda Lempens

Gert-Jan Gerardus Johannes Thomas Brands

Tijmen Wilfred Mathijs Gunther

Daniël Jozef Maria Direcks

Arie Gerrit Izaäk Van Der Velde

A fluid handling structure for a lithographic apparatus is disclosed. The fluid handling structure has a plurality of openings arranged in plan, in a line. The fluid handling structure is configured such that the openings are directed, in use, towards a facing surface, the facing surface being a substrate and/or a substrate table. The substrate table is configured to support the substrate. Outward of the line of openings is a damper. The damper may have a width that varies along the line of openings. The damper width is defined between the line of openings and an opposing damper edge.

Fluid handling structure, lithographic apparatus and device manufacturing method

An immersion lithographic apparatus is disclosed that includes a fluid supply system configured to supply a fluid, the fluid supply system having a chamber with a plurality of inlet holes in a first side wall and a plurality of outlet holes in a second side wall, the first side wall facing the second side wall, wherein the inlet holes direct fluid entering the chamber in a direction towards areas of the second side wall between the plurality of outlet holes.

Lithographic apparatus

A lithographic apparatus includes a substrate table constructed to hold a substrate, a projection system configured to project a patterned radiation beam through an opening and onto a target portion of the substrate, and a conduit having an outlet in the opening. The conduit is configured to deliver gas to the opening. The lithographic apparatus further includes a cooling apparatus controlled by a control system. The cooling apparatus is configured to cool the gas such that gas which travels from the opening to the substrate has a predetermined temperature when the gas is incident upon the substrate.

Lithographic apparatus and device manufacturing method

A fluid handling structure configured to supply immersion liquid to a space defined between a projection system and a facing surface facing the fluid handling structure is disclosed. An undersurface of the fluid handling structure has a supply opening configured to supply fluid toward the facing surface, a plurality of extraction openings configured to remove fluid from between the fluid handling structure and the facing surface, and a protrusion between the supply opening and the extraction openings.

Fluid handling structure, lithographic apparatus and a device manufacturing method

A fluid handling structure and lithographic apparatus is disclosed in which measures are taken, in particular to the dimensions and spacing of an array of openings in a bottom surface of the fluid handling structure, to deal with and/or prevent formation of bubbles in immersion liquid.

A fluid handling structure is disclosed in which the size and arrangement of the fluid extraction openings is specified in order to reduce the vibrations which are transmitted to the fluid handling structure as a result of two-phase extraction. The area of each fluid extraction opening and/or the total area of all of the fluid extraction openings and/or the space in between neighboring fluid extraction openings may be controlled. The reduction in vibrations increases the accuracy of the exposure.

A fluid handling structure configured to supply and confine immersion liquid to a space defined between a projection system and a facing surface facing the fluid handling structure is disclosed. A first portion of an undersurface of the fluid handling structure, in use, is a different distance from the facing surface than a second portion of the undersurface. Further, the first portion has defined in it a supply opening configured to supply liquid toward the facing surface, and an extraction opening configured to remove fluid from between the fluid handling structure and the facing surface.

A fluid handling structure is disclosed in which measures are taken to increase the speed at which meniscus breakdown occurs. Measures include the shape of a plurality of fluid extraction openings and the shape and density of a plurality of fluid supply openings in the fluid handling structure.

An immersion lithographic apparatus is described in which a liquid removal device is arranged to remove liquid from the substrate, e.g. during exposures, through a plurality of elongate slots arranged along a line and angled to that line. The liquid removal device may act as a meniscus pinning device in an immersion hood or may be used in a drying device to remove a droplet from the substrate.

Immersion lithographic apparatus, drying device, immersion metrology apparatus and device manufacturing method

An immersion lithographic apparatus is described in which a droplet removal device removes droplets from the substrate, e.g. during exposures, using an angled flow of gas from a gas knife.

Immersion lithographic apparatus and device manufacturing method

Mould assembly () consisting of two interacting mold sections (). One mold section is provided with a seat () and the other mould section with a body () that is accurately accommodated by the seat (), the body/seat interaction having a centering effect. The seat () is delimited by a series of ridge-shaped elements () that are arranged according to an annular shape. The rigidity thereof in the radial direction is greater than that in the axial direction.

Mould assembly provided with centering means

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Son en Breugel, Netherlands

Danny Maria Hubertus Philips