Taiwan Semiconductor Manufacturing Comp. Ltd.

Danny Kuo

Chien-Shen Chen

Yu-Ping Tseng

Wai-Ming Yeung

Charlie Wang

Yu-Hsuan Hsieh

Y J Chen

Hsuan Lo

A cleaning process monitoring system, comprising: a cleaning container comprising an inlet for receiving a cleaning solution and an outlet for draining a waste solution; a particle detector coupled to the outlet and configured to measure a plurality of particle parameters associated with the waste solution so as to provide a real-time monitoring of the cleaning process; a pump coupled to the cleaning container and configured to provide suction force to draw solution through the cleaning system; a controller coupled to the pump and the particle detector and configured to receive the plurality of particle parameters from the particle detector and to provide control to the cleaning system; and a host computer coupled to the controller and configured to provide at least one control parameter to the controller.

Method and apparatus for cleaning process monitoring

Growing community of inventors

Taipei, Taiwan

Danny Kuo