Globalfoundries Inc.

Daniel Zschaebitz

Richard P Good

Andre Poock

Dirk Gleitsmann

Heike Scholtz

Methods according to the disclosure include: identifying at least one non-candidate tool which previously processed at least one prior semiconductor wafer, and represented in a set of historical data, the set of historical data including manufacturing settings for performing an operation on the at least one prior semiconductor wafer, and a candidate tool which has not previously performed the operation on at least one prior semiconductor wafer, the candidate tool not being represented in the set of historical data; determining whether the set of historical data predicts the performing of the operation with the candidate tool based on the manufacturing settings for performing the operation on the at least one prior semiconductor wafer; and in response to the set of historical data predicting the performing of the operation with the candidate tool, selecting a manufacturing setting for the candidate tool based on the set of historical data.

Selecting manufacturing settings based on historical data from manufacturing tools

A process monitoring system may detect out-of-control situations on the basis of a single criterion for a plurality of different lithography processes. To this end, each data set related to a specific type of lithography process may be processed so as to determine relative data, which may be centered around the same mean value for each of the different process types for a standard control situation.

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Dresden, Germany

Daniel Zschaebitz