Shipley Company LLC

Daniel Y Pai

Roger F Sinta

Charles R Shipley

Philip D Knudsen

Timothy G Adams

Egon Matijevic

Stephen S Rodriguez

Robert E Hawkins

George J Cernigliaro

Todd A Richardson

Gary S Calabrese

Kevin J Cheetham

Yie-Shein Her

A photoresist composition comprising an alkali soluble resin and the reaction product of an ortho-naphthoquinone diazide sulfonic acid ester and a vinyl ether. In use, the photoresist is characterized by having at least a portion of the hydroxyl groups on the alkali soluble resin reacted with the photoactive compound and then deblocked by acid generation.

Acid labile photoactive composition

The adsorption of cationic dyes on nanosize negatively charged silica particles to form colored pigments is disclosed. The dyes are chemisorbed and their uptake is controlled by the strong chemical reaction between the negative surface of the adsorbent silica particles preferably with sodium counter ions and the positive charge of the dyes. The prepared pigments are useful in the formation of color films and their optical properties are described. Photoresists using nanosized pigments are also disclosed herein which are useful in making color filters for liquid crystal displays.

Dyed silica pigments and products made from same

The adsorption of anionic dyes on nanosize alumina modified silica particles to form colored pigments is disclosed. The dyes are chemisorbed and their uptake is controlled by the strong chemical reaction between positive surface of the absorbent and negative charge of the adsorbates. The prepared pigments are useful in the formation of color films and their optical properties are described. Photoresists using nanosized pigments are also disclosed herein which are useful in making color filters for liquid crystal displays.

Dye incorporated pigments and products made from same

A photoresist composition comprising an alkali soluble resin and an ortho-naphthoquinone diazide sulfonic acid ester of a polyhydroxy alcohol. The photoresist is characterized by having at least a portion of its free hydroxyl groups on the photoactive compound blocked with an acid labile blocking group that generates a hydroxide upon cleavage.

Method for increasing the differential solubility of an imaged

Radiation sensitive compositions, processes for using the compositions, and articles of manufacture comprising the compositions. The photoimageable compositions of the invention comprises a radiation sensitive component, a resin binder and a polybutadiene that comprises one or more internal epoxide groups. In preferred aspects, the compositions of the invention further comprise a crosslinking agent such as a melamine or an epoxidized material, or mixtures thereof.

Process of making flexible circuits and imaged coatings

A photoresist composition comprising an alkali soluble resin, an o-naphthoquinone diazide sulfonic acid ester photoactive compound, and a vinyl ether compound. The o-naphthoquinone diazide sulfonic acid ester is replaced in part with the vinyl ether composition to decrease the concentration of the photoactive compound while increasing the photospeed of the composition.

Photoresist composition comprising an alkali-soluble resin, a quinone

Photoresist composition with improved differential solubility through

A radiation sensitive composition, process for using said composition, and substrates coated with said composition. The photoimageable composition comprises a photobase generator compound, a resin binder and a material capable of crosslinking in the presence of base. In preferred aspects, the invention provides a negative-acting, aqueous developable photoimageable composition comprising a photobase generator compound, a resin binder which preferably is a phenolic polymer, a crosslinking agent that comprises one or more active groups that will undergo base-initiated crosslinking, and a curing agent.

Photoimageable resist compositions containing photobase generator

The present invention provides photoimageable compositions, processes and articles of manufacture. In particular, the invention provides a process comprising electrophoretically applying a coating layer of a photoimageable composition onto a conductive surface, the composition comprising a material that contains one or more photoacid labile groups. The photoimageable compositions of the invention preferably comprise a photoacid generator, a material that contains one or more acid-clearable functional groups, and a carrier resin that contains one or more functional groups that are, or can be treated to be, at least partially ionized.

Photoimageable compositions for electrodeposition

Photoimageable compositions comprising polybutadiene having internal

The invention provides radiation sensitive compositions that comprise an amphoteric polymer, the polymer comprising at least two distinct carrier groups so that the polymer is positively polarized or negatively polarized upon treatment with an acid or base, respectively, enabling the compositions to be electrodeposited either anaphoretically or cataphoretically. Employing this amphoteric polymer in a radiation sensitive composition also allows the use of either an acid or base solution to image and remove the deposited composition irrespective of whether the composition was applied cataphoretically or anaphoretically. The compositions of the invention are also suitably formulated as liquid coating compositions or used to form dry film resists.

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Millbury, MA, United States of America

Daniel Y Pai