Clean Crop Technologies, Inc.

Daniel White

Kevin Michael Keener

Yaqoot Shaharyar

Daniel Cavanaugh

A system for treating food, the system including: a direct barrier discharge system including a pair of electrodes separated by a gap of at least 0.5 cm, wherein the direct barrier discharge system is configured to provide a feed gas between the electrodes, wherein the feed gas includes nitrogen and water, wherein a content of nitrogen in the feed gas is at least 75 vol % based on a total volume of the feed gas, and a relative humidity of the feed gas is at least 50% RH, wherein a content of oxygen in the feed gas is less than 1.5 vol % based on a total volume of the feed gas, and wherein the direct barrier discharge system is configured to provide an electric potential between the electrodes to generate a working gas having an ozone content of less than 20 ppm, based on a total volume of the working gas.

System and method for treatment of food with a gas

Systems and methods disclosed herein provide an improved high voltage plasma-based product treatment by integrating the plasma reactor into the processing container. This unique device can deliver a high throughput rate of raw food, without adverse effects on quality. The system is operationally efficient, and is capable of being scaled up or down to provide lower or higher throughput rates, depending on the product manufacturer or processor's needs. In particular, the system obviates the need for further containerization or packaging of product during pasteurization processing.

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Chesterfield, MA, United States of America

Daniel White