Photon Dynamics, Inc.

Orbotech Limited

Daniel Toet

Abraham Gross

Kaushal Gangakhedkar

Robert L Barnett

David L Baldwin

Arie Glazer

Kent Nguyen

Steve Aochi

Hai Tran

Neil Dang Nguyen

Ronen Loewinger

Alexander Kadyshevitch

Eric Thompson

Ofer Kadar

A non-mechanical contact signal measurement apparatus includes a first conductor on a structure under test and a gas in contact with the first conductor. At least one electron beam is directed into the gas so as to induce a plasma in the gas where the electron beam passes through the gas. A second conductor is in electrical contact with the plasma. A signal source is coupled to an electrical measurement device through the first conductor, the plasma, and the second conductor when the plasma is directed on the first conductor. The electrical measurement device is responsive to the signal source.

Electrical inspection of electronic devices using electron-beam induced plasma probes

A system performs continuous full linear scan of a flat media. The system includes, in part, a chuck, and at least first, second and third gantries. The chuck is adapted to support the flat media during the test. The first gantry includes at least one linear array of non-contacting sensors that spans the width of the flat media and is adapted to move across an entire length of the flat media. Each of the second and third gantries includes a probe head that spans the width of the flat media and each is adapted to apply an electrical signal to the flat media. Each probe head is further adapted to move along a direction substantially perpendicular to the surface of the flat media during the times when the first gantry is in motion and while test signals are being continuously applied.

Continuous linear scanning of large flat panel media

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Santa Clara, CA, United States of America

Daniel Toet