Matheson Tri-gas, Inc.

Daniel Tempel

Mark Raynor

Junpin Yao

Larry Wagg

Adam Seymour

Hideharu Shimizu

Daniel Alvarez, Jr

Robert Torres, Jr

Robin Gardiner

The present invention generally relates to methods and apparatuses adapted to perform additive manufacturing (AM) processes and the resulting products made therefrom, and specifically, to AM processes that employ an energy beam to selectively fuse a base material to produce an object. More particularly, the invention relates to methods and systems that use reactive fluids to actively manipulate the surface chemistry of the base material prior to, during and/or after the AM process.

Use of reactive fluids in additive manufacturing and the products made therefrom

The present invention generally relates to the field of gas and liquid phase desiccation. In particular, the present invention relates to methods for removing moisture (and hence oxygen precursors) from hydrazine, thereby providing a high purity source gas suitable for use in vapor deposition processes, such as but not limited to, chemical vapor deposition (CVD) or an atomic layer deposition (ALD).

Removal of moisture from hydrazine

The present invention relates, in general, to the purification of boron trichloride (BCl). More particularly, the invention relates to a process for minimizing silicon tetrachloride (SiCl) formation in BClproduction and/or the removal of SiClin BClproduct stream by preventing/minimizing the silicon source in the reaction chambers. In addition, a hydride material may be used to convert any SiClpresent to SiHwhich is easier to remove. Lastly freeze separation would replace fractional distillation to remove SiClfrom BClthat has been partially purified to remove light boilers.

Reduction of SiCl4 in the presence of BCl3

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Erie, CO, United States of America

Daniel Tempel