Brewer Science, Inc.

Daniel Sweat

Kui Xu

Mary Ann Hockey

Eric Calderas

Richard Elsworth Daugherty, Jr

Megan Bennett

Jakub Koza

Jamie Storie

Adhesive additives are disclosed that enhance spin-on carbon (SOC) resistance to SC-1 wet etch. The additives can be formed by reacting a polymer or oligomer (such as an adhesion polymer or adhesion oligomer) with 3,4,5-triacetoxybenzoic acid (TABA). When added to standard SOC layers or used as a primer between an SOC layer and substrate, these additives enhance the adhesion of the SOC layer to TiN and other substrates and reduce undercut during SC-1 wet etch.

Coating compositions and methods to enhance SC-1 resistance

The present invention is broadly concerned with novel directed self-assembly compositions, processes utilizing those compositions, and the resulting structures that are formed. The composition comprises a block copolymer of polystyrene and a polymethylmethacrylate block with polylactic acid side chains ('PS-b-P(MMA-LA)'). The block copolymer is capable of crosslinking and micro-phase separating into lines and spaces measuring about 10-nm or smaller with sub-20 nm Lcapability. Additionally, PS-b-P(MMA-LA) can be thermally annealed without a top-coat for simpler processing than the prior art. The polylactic acid side chains also increase the etch rate of the poly(methylmethacrylate) block when exposed to oxygen plasma, as well as lower the T.

High-&#x3c7; block copolymers for directed self-assembly

Novel block copolymers ('BCPs') having non-random distributions of comonomers within at least one of the blocks and methods of using those BCPs in directed self-assembly ('DSA') processes are provided. The non-random (e.g., gradient-creating) distributions can be customized in order to concentrate the desired comonomer properties in predetermined areas of the BCP. These BCPs can achieve perpendicular orientation with simple annealing and offer superior long-range ordering and lower defectivity when compared to prior art BCPs. These BCPs can be incorporated into compositions that simultaneously offer the benefits of high-&#x3c7; and rapid thermal-annealing kinetics while maintaining similar or improved guide process windows when compared to prior art BCPs.

Gradient block copolymers for directed self-assembly

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Daniel Sweat