Von Ardenne Gmbh

Von Ardenne Anlagentechnik Gmbh

Von Ardenne Asset Gmbh &co. Kg

Daniel Stange

Michael Hentschel

Thomas Meyer

Hubertus Von Der Waydbrink

Hans-Christian Hecht

Reinhard Jaeger

Michael Brandt

Marco Kenne

Damir Muchamedjarow

Steffen Grosser

Hubertus Von Der Waybrink

Sven Heinrich

Christoph Dubau

A processing arrangement comprising: a process chamber comprising an upper chamber wall, a lower chamber wall and two lateral chamber walls; an insulating structure, arranged between the processing region and each of the upper chamber wall, the lower chamber wall and the two lateral chamber walls, respectively, for thermally insulating the processing region, wherein the insulating structure is configured as gas-permeable at least in sections in such a way that a process gas from the processing region can flow out of the processing region in the direction in each of the upper chamber wall, the lower chamber wall and the two lateral chamber walls, respectively, through the insulating structure; and a gas channel, arranged between the insulating structure and each of the upper chamber wall, the lower chamber wall and the two lateral chamber walls, respectively, for pumping away the process gas which flows through the insulating structure.

Processing arrangement and method for conditioning a processing arrangement

In various embodiments, a transporting device for transporting a substrate in a process chamber is provided. The transporting device includes a guiding rail arrangement having two guiding rails for mounting a multiplicity of bars between the two guiding rails. The two guiding rails form a closed path of movement along which the multiplicity of bars are guided. The transporting device further includes the multiplicity of bars that are mounted in the guiding rail arrangement, and a drive device for pushing at least one bar of the multiplicity of bars in such a way that, in a transporting region of the guiding rail arrangement, in each case multiple bars of the multiplicity of bars are pushed against one another and the bars that have been pushed against one another move along the path of movement in the transporting region.

Transporting device, processing arrangement and coating method

A substrate treatment plant includes a process chamber delimited by chamber walls and in the process chamber a substrate conveying unit for the horizontal conveyance of slab-shaped substrates in one conveying plane and in one conveying direction. The substrate conveying unit includes an arrangement of rotatably mounted, cylindrical conveying rollers transversely arranged to the conveying direction, the topmost generatrices of the conveying rollers defining the conveying plane, and at least one substrate treatment unit, which is located above the conveying plane, and at least one gas inlet. In the region of the substrate treatment unit at least one additional heating unit is located below the conveying plane and a condensation unit is located under the substrate conveying unit.

Continuous substrate treatment plant and cleaning method

A surface heating device for a substrate treatment device with increased power density and improved homogeneity of heat radiation includes a jacket tube heater with straight tube sections and bent tube sections in which straight tube sections are arranged parallel to each other in a main plane and straight tube sections are connected to each other by bent tube sections, so that at least part of the bent tube sections are aligned sloped relative to the main plane.

Surface heating device for a substrate treatment device and substrate treatment device

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Dresden, Germany

Daniel Stange