Carl Zeiss Smt Gmbh

Daniel Runde

Ulrich Mueller

Christian Wald

Christoph Petri

Markus Deguenther

Hubert Holderer

Matthias Manger

Markus Holz

Juergen Baier

Joachim Welker

Stefan Schaff

André Orthen

Joerg Lichtenthaeler

Michael Gerhard

Gundula Weiss

Reinhard Voelkel

Florian Baumer

Kenneth Weible

Florian Doll

When replacing a mirror in a projection exposure apparatus, a mirror for replacement is initially removed (). Position- and orientation data of the removed mirror for replacement are measured () by a position -and orientation data measuring device. Furthermore, position- and orientation data of a replacement mirror, to be inserted in place of the mirror for replacement, are measured () using the position- and orientation data measuring device. Bearing points of the replacement mirror are reworked () on the basis of ascertained differences between, firstly, the position- and orientation data of the mirror for replacement and, secondly, the position- and orientation data of the replacement mirror. The reworked replacement mirror is installed (). This yields a mirror replacement method, in which an adjustment outlay of the replacement mirror in the projection exposure apparatus is reduced.

Method for replacing a mirror in a projection exposure apparatus, and position- and orientation data measuring device for carrying out the method

The disclosure relates to a method for producing an illumination system for an EUV apparatus in and to an illumination system for an EUV apparatus.

Method for producing an illumination system for an EUV projection exposure system, and illumination system

An optical waveguide serves for guiding illumination light. The waveguide has a waveguide main body for guiding the illumination light between a main body entrance region and a main body exit region. At least one coupling-out device is provided in the main body exit region. Via the coupling-out device, at least one coupling-out illumination light partial beam is coupled out from the illumination light emerging from the waveguide main body. This is done such that the coupling-out illumination light partial beam can be separated from the rest of the illumination light beam emerging from the waveguide main body. This results in a waveguide having improved possibilities for use when guiding illumination light.

Optical waveguide for guiding illumination light

An illumination system for an EUV projection exposure apparatus is designed for shaping illumination radiation from at least a portion of received EUV radiation. The illumination radiation is directed into an illumination field in an exit plane of the illumination system during exposure operation. An EUV radiation source is arranged in a source module separate from the illumination system. The illumination system includes an alignment state determining system including an alignment detector configured to receive a portion of the EUV radiation emerging from the secondary radiation source and to generate therefrom an alignment detector signal representative of the alignment state.

Illumination system for EUV projection exposure apparatus, EUV projection exposure apparatus including illumination system and method for operating an EUV projection exposure apparatus

A method for determining a corrected variable, which depends on at least one parameter, in a parameter range of the parameter, includes carrying out a measurement, measurement values of the variable being made available in a plurality of separate and non-overlapping subranges of the parameter range; correcting measurement values of the variable using an approximation, in which measurement values of the variable are approximated with a smooth function and with subrange functions of the subranges of the parameter range. The smooth function allows reproduction of the progression of the variable over the parameter range. The subrange functions permit an individual change of the variable in the subranges. Also disclosed are methods for adjusting imaging optics of an optical system, devices for determining a corrected variable, which depends on at least one parameter in a parameter range, and methods for determining a plurality of corrected wavefront errors in an image field.

Determination of a corrected variable

An optical beam deflecting element may be used effectively as an energy distribution manipulator in an illumination system to vary the energy distribution within a given spatial intensity distribution in a pupil plane of the illumination system substantially without changing the shape and size and position of illuminated areas in the pupil plane.

Optical beam deflecting element, illumination system including same, and related method

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Oberkochen, Germany

Daniel Runde