Seriosity, Inc.

Molecular Imprints, Inc.

Gradient Design Automation Inc.

Daniel Rubin

David Abecassis

Byron B Reeves

Mark Phillips

Leighton Read

Helen Cheng

Simon Roy

Rajit Chandra

A centrally tracked artificial currency is provided within the context of an enterprise. This currency serves as a unit of account, medium of exchange, and store of value in a corporate 'attention economy.' Users (typically coworkers) in the enterprise are allotted a base number of currency units, which they can earn, exchange, and spend in a variety of ways to signal importance and 'purchase' attention of others, or priority for other organization resources. In one aspect, senders of messages can specify an amount of currency to be associated with the message, so that recipients can see the specified amount before deciding whether to read the message. Once such a system is in use, it facilitates exchange of value based on user-created transactions regarding behavior, communication, resources, incentives, and priorities.

Attention economy for attention to messages, tasks and resources

A method and apparatus for normalizing thermal gradients over semiconductor chip designs is provided. One embodiment of a novel method for normalizing an expected thermal gradient includes determining a location of the thermal gradient in the semiconductor chip design and inserting at least one supplemental heat source into the semiconductor chip design such that the thermal gradient is normalized by heat dissipated by the supplemental heat source.

Method and apparatus for normalizing thermal gradients over semiconductor chip designs

The present invention is directed to a method of reducing distortions in a pattern disposed on a layer of a substrate, defining a recorded pattern, employing a mold having the pattern recorded therein, defining an original pattern. The method includes, defining a region on the layer in which to produce the recorded pattern. Relative extenuative variations between the substrate and the mold are created to ensure that the original pattern defines an area coextensive with the region. Thereafter, the recorded pattern is formed in the region. The relative extenuative variations are created by heating or cooling of the substrate so that the region defines an area that is slightly smaller/larger than the area of the original pattern. Then compression/tensile forces are applied to the mold to provide the recorded pattern with an area coextensive with the area of the region.

Method of reducing pattern distortions during imprint lithography processes

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Atherton, CA, United States of America

Daniel Rubin