Particle Measuring Systems, Inc.

Daniel Rodier

Brian A Knollenberg

Dwight A Sehler

James M Lumpkin

Ronald W Adkins

Scott Waisanen

Gerald Gromala

Gilberto Dalmaso

Edward Yates

Mehran Vahdani Moghaddam

Dale Griffin

Chris Bonino

Timothy A Ellis

Isidro Sanchez

Thomas Ramin

Dwight Sehler

Modular docking station and methods for sampling and monitoring gas and other fluids, where a sampling device is able to be removably attached to the docking station, thereby allowing the sampling device to be replaced without having to remove or disconnect the docking station from the rest of the sampling system. This allows the docking station to remain connected to the rest of the system with minimal or no interruption and reduces maintenance costs and time when replacing the sampling device.

Modular particle counter with docking station

Particle detection systems and methods are disclosed. In one embodiment, a particle detection system comprises an incident beam light source that emits an incident beam, a particle interrogation zone disposed in the path of the incident beam, a photodetector disposed to detect the incident beam after passing through the particle interrogation zone, a pump beam light source for emitting a pump beam, the pump beam being targeted at the particle interrogation zone, wherein the incident beam, the pump beam, and photodetector are arranged such that the photodetector is configured to detect a combination of light from the incident beam, scattered light due to incident beam scattering in the particle interrogation zone, and scattered light due to pump beam scattering in the particle interrogation zone.

Particle detection via scattered light combined with incident light

The present invention relates to interferometric detection of particles and optical detection of particles having size dimensions less than or equal to 100 nm. Systems and methods are provided exhibiting enhanced alignment and stability for interferometric detection of particles and/or optical detection of particles having size dimensions less than or equal to 100 nm. Systems and methods are provided that include compensation means for mitigating the impact of internal and external stimuli and changes in operating conditions that can degrade the sensitivity and reliability of particle detection via optical methods, including interferometric-based techniques and/or systems for optical detection of particles having size dimensions less than or equal to 100 nm.

Advanced systems and methods for interferometric particle detection and detection of particles having small size dimensions

Provided herein are optical systems and methods for detecting and characterizing particles. Systems and method are provided which increase the sensitivity of an optical particle counter and allow for detection of smaller particles while analyzing a larger fluid volume. The described systems and methods allow for sensitive and accurate detection and size characterization of nanoscale particles (e.g., less than 50 nm, optionally less than 20 nm, optionally less than 10 nm) for large volumes of analyzed fluids.

Particle detection systems and methods for on-axis particle detection and/or differential detection

Provided herein is a particle analyzer that is operably connected to a probe unit that is capable of both dislodging particles from a surface and sampling the particles after they have been dislodged. The devices and methods described herein may be lightweight and/or handheld, for example, so that they may be used within a cleanroom environment to clean and sample permanent surfaces and tools. The devices may include optical particle counters that use scattered, obscured or emitted light to detect particles, including condensation particle counting systems or split detection optical particle counters to increase the sensitivity of the device and thereby facilitate detection of smaller particles, while avoiding the increased complexity typically required for the detection of nanoscale particles, such as particles less than 100 nm in effective diameter.

Detecting nanoparticles on production equipment and surfaces

Provided herein are particle detection systems, and related methods configured to characterize a liquid sample, comprising: a first probe configured to determine a first parameter set of a plurality of first particles in a liquid sample, the first particles characterized by a size characteristic selected from a first size range; wherein the first parameter set comprises a first size distribution and a first concentration; and a second probe configured to determine a second parameter set of one or more second particles in the liquid sample, the second particles being characterized by a size characteristic selected from a second size range; wherein the second parameter set comprises a second size distribution and a second concentration.

Slurry monitor coupling bulk size distribution and single particle detection

Described herein are monitoring systems and methods, including for airborne molecular contamination (AMC), that combine a sampler, such as an impinger or sorbent tube with a real time analyzer, such as an ion mobility spectrometer (IMS) or optical particle counter. The system may allow for selective sampling in which the sampler is only exposed to the target fluid during periods in which the real time analyzer detects analytes, such as molecular contamination or particles, meeting particular criteria such the composition and/or concentration of analytes. The invention also includes impinger systems having a sampler reservoir comprising an anion leaching resistant material characterized by low anion leach rates in the presence of deionized water.

Triggered sampling systems and methods

This invention is in the field of systems and methods for controlling contamination in high purity environments. This invention relates generally to particulate filtering and treatment of molecular contamination and process gases in enclosures, such as cleanrooms, contamination controlled manufacturing environments, mini-environments, isolators, glove boxes and restricted air barrier systems (RABS). The invention is capable of chemically transforming molecular contamination and process gases into less reactive or inert reaction products while at the same time decreasing the level of biological and nonbiological particulates.

Active filtration system for controlling cleanroom environments

Method of treating a cleanroom enclosure

A molecular contamination monitoring system includes a piezoelectric measurement sensor exposed to a molecular constituent to be measured; a piezoelectric reference sensor; and a filter for filtering said molecular constituent, the filter located between the reference sensor and the measurement environment. The reference sensor is exposed to the same ambient conditions of temperature, pressure and humidity as the measurement sensor. Alternatively, there may be a plurality of different reference sensors having different filters, or there may be a plurality of different measurement sensors.

System and method for measuring molecular analytes in a measurement fluid

A flow-through monitor for detecting molecular contamination (MC) within a fluid flow. The monitor has a diffusion chamber having an inlet port and an outlet port, and a structure for supporting a fluid flow from the inlet port to the outlet port. The structure includes a flow gap causing a diffusion of molecular contaminants into the diffusion chamber, while substantially preventing, for a rate of the fluid flow above a predetermined magnitude, particulate contaminants within the fluid from entering the diffusion chamber. A SAW device detects molecular contamination interior to the diffusion chamber. Fluid input to the flow-through monitor may be diluted by a pure fluid for extended monitor life. A system for aggregate sampling connects an ensemble manifold upstream of the flow-through monitor. A system for triggered sampling connects a sample preconcentrator downstream of the flow-through monitor. A chemically selective membrane may be located between the flow gap and the SAW. A test surface adapted to collect MC and located to sample the same fluid as the SAW may also be combined with the monitor. A chemical filter and/or heater may be located upstream of the flow-through monitor and valved to the monitor alternately to the unfiltered and unheated sample.

Molecular contamination monitoring system and method

A molecular contamination monitor for monitoring molecular contamination on a surface of a subject surface susceptible to degradation by a molecular contaminant. The monitor includes a surface acoustic wave (SAW) device having a SAW measurement surface coated with a material that is equivalent to the subject material with respect to spontaneous contamination by a contaminant. In the preferred embodiment, the coating comprises the same material as the subject surface or a material that interacts chemically with the contaminant in an equivalent manner to the subject surface. Exemplary coatings include: photoresist, copper, silver, gold, platinum, titanium, tungsten, aluminum, nickel, metal oxides, stearic acid, silicon, gallium arsenide, gallium nitride, germanium, silicon germanium, silicon dioxide, silicon nitride, and glass. Exemplary coating methods include sputtering, CVD, ALD and misted deposition.

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Boulder, CO, United States of America

Daniel Rodier