Corning Incorporated

Daniel Raymond Sempolinski

Michael Henry Wasilewski

James Gerard Fagan

Richard Sean Priestley

Merrill F Sproul

Chunzhe C Yu

Nicholas Francis Borrelli

Charlene Marie Smith

Kenneth Edward Hrdina

Steven Roy Burdette

Robert Stephen Pavlik, Jr

Sumalee Likitvanichkul

C Charles Yu

Floyd E Marley

Latha I Swaroop

Sean Matthew Garner

Richard Michael Fiacco

Roger J Araujo

Polly Wanda Chu

Cheng-Chung Li

Carlos Alberto Duran

Stephen Joseph Caracci

John Edward Maxon

Robert E McLay

Terry Lee Taft

Adam J Fusco

Thomas P Seward

Thomas William Hobbs

William P Peters

Alfredo D Botet

Pattarin McLaren

Michael John Walters

Cynthia K Rosplock

Thomas W Hobbs

Robert S Pavlik

James E Maxon

Disclosed are synthetic silica glass body with a birefringence pattern having low fast axis direction randomness factor and glass reflow process. The glass reflow process comprises steps of: providing a glass tube having a notch; and thermally reflowing the glass tube to form a glass plate. The process can be advantageously used to produce fused silica glass plate without observable striae when viewed in the direction of optical axis. Also disclosed are optical members comprising the fused silica glass body and a process for reflowing glass cylinders.

Thermal reflow of glass and fused silica body

A fused silica glass article having a low absolute refractive index and low concentrations of hydroxyl groups, halogens, and metal having a low absolute refractive index. The glass article contains less than about 10 ppm protium-containing and deuterium-containing hydroxyl groups by weight and less than about 20 ppm halogens by weight. The silica glass article also has an absolute refractive index (ARI) less than or equal to 1.560820. In one embodiment, the ARI of the fused silica article is achieved by lowering the fictive temperature of the fused silica. A method of lowering the fictive temperature is also described.

High purity fused silica with low absolute refractive index

A method of making a fused silica plate includes providing a fused silica blank having a length, a longitudinal axis, and an outer diameter. The method further includes forming a slot in the fused silica blank which extends from the outer diameter to a location at or offset from a center of the fused silica blank and is substantially parallel to the longitudinal axis of the fused silica blank. The slot is defined by a concave surface located at or offset from the center of the fused silica blank, a first side surface extending between a first edge of the concave surface and the outer diameter of the fused silica blank, and a second side surface extending between a second edge of the concave surface and the outer diameter of the fused silica blank. At least one of the first and second side surfaces are connected to the concave surface by a chamfered surface. The method further includes rolling out the fused silica blank having the slot to form a fused silica plate.

Fused silica blank and method of forming a fused silica plate from the same

Disclosed is a method for treating glass and crystalline inorganic materials whereby metal contamination during such process is inhibited. Such process includes treating the material in the presence of a purifying atmosphere comprising a cleansing gas. The process is especially advantageous for treating high purity fused silica glass for use in advanced lithographic devices.

Method for suppressing metal contamination in high temperature treatment of materials

Articles and methods for manufacturing pigtailed planar optical devices are disclosed. The articles and methods include providing a tool including a substrate having a stepped region. The tool is capable of forming elements such as grippers or waveguides on a device substrate having different heights.

Passive alignment of optical fibers with optical elements

Methods and apparatus for producing fused silica members having high internal transmission are disclosed. The apparatus and methods are capable of producing fused silica having internal transmission of at least 99.65%/cm at 193 nm.

Furnaces for fused silica production

The invention provides optical projection lithography methods, photolithography photomasks, and optical photolithography mask blanks for use in optical photolithography systems utilizing deep ultraviolet light (DUV) wavelengths below 300 nm, such as DUV projection lithography systems utilizing wavelengths in the 248 nm region and the 193 nm region. The invention provides improved production of lithography patterns by inhibiting polarization mode dispersion of lithography light utilizing low birefringence mask blanks and photomasks.

Photolithography method, photolithography mask blanks, and method of making

Methods and furnaces for fused silica production

Fused silica articles exhibiting improved internal transmission and decreased absorption change when irradiated with a laser when compared with fused silica articles containing lower levels of aluminum. The articles also exhibit induced transmission when irradiated with a laser.

Fused silica containing aluminum

Methods and apparatus for adding metals such as aluminum to fused silica glass articles are disclosed. The methods and apparatus allow for controlled, low level addition of metals into fused silica glass articles. The fused silica glass articles containing added aluminum exhibit improved internal transmission and decreased absorption change when irradiated with a laser.

Method and apparatus for adding metals to fused silica

Fused silica articles containing at least 50 ppb aluminum are disclosed. The fused silica articles containing these levels of aluminum exhibit improved internal transmission and decreased absorption change when irradiated with a laser when compared with fused silica articles containing lower levels of aluminum.

The invention relates to optical glass having improved initial transmittance, formed by subjecting the glass to a hydrogen and/or deuterium treatment at a temperature, and for a duration of time sufficient to diffuse the hydrogen and/or deuterium into the glass.

Method of increasing the initial transmittance of optical glass

An optical member includes a fused silica glass having a concentration of &equiv;SiH moiety below detection limit as measured by Raman spectroscopy and a concentration of molecular hydrogen of at least 1&times;10 molecules/cm . The fused silica glass exhibits an induced absorption level which quickly attains an initial peak upon exposure to irradiation and rapidly decays to a low value. The induced absorption level after decaying to the low value remains substantially unchanged by further irradiation.

Fused silica with constant induced absorption

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Painted Post, NY, United States of America

Daniel Raymond Sempolinski