Bruker Nano Gmbh

Daniel Radu Goran

Thomas Schwager

Luca Bombelli

Waldemar Hahn

Paolo Trigilio

A method for improving the quality/integrity of an EBSD/TKD map, wherein each data point is assigned to a corresponding grid point of a sample grid and represents crystal information based on a Kikuchi pattern detected for the grid point; comprising determining a defective data point of the EBSD/TKD map and a plurality of non-defective neighboring data points, comparing the position of Kikuchi bands of a Kikuchi pattern detected for a grid point corresponding to the defective data point with the positions of bands in at least one simulated Kikuchi pattern corresponding to crystal information of the neighboring data points and assigning the defective data point the crystal information of one of the plurality of neighboring data point based on the comparison.

Method for improving an EBSD/TKD map

A pixelated sensor comprises a semiconductor substrate chip with a plurality of sensor pixels and a detector chip with a plurality of detector pixels. Each of the sensor pixels is configured as a photodiode and is electrically connected to an input node of one of the detector pixels. The detector pixels are further configured to convert and output the sensor input to an analog to digital converter. The detector chip further comprises first and second macropixels and a plurality of second macropixels, wherein each first macropixel is formed by subset of detector pixels switchably interconnected via a first conducting grid and wherein each second macropixel is formed by a subset of first macropixels switchably interconnected via a second conducting grid.

Detector, methods for operating a detector and detector pixel circuit

A detector for Kikuchi diffraction comprising a detector body and a detector head mountable to each other. The detector body comprises a body part which is enclosing a photodetector configured for detecting incident radiation and further comprises a vacuum window arranged upstream the photodetector with respect to a propagation direction of the incident radiation, a first body mounting portion configured to be mounted to a SEM chamber port and a second body mounting portion. The detector head comprises a scintillation screen and a head mounting portion configured to be mounted to the second body mounting portion.

Kikuchi diffraction detector

The present invention refers to a method for improving a Transmission Kikuchi Diffraction, TKD pattern, wherein the method comprises the steps of: Detecting a TKD pattern () of a sample () in an electron microscope () comprising at least one active electron lens () focusing an electron beam () in z-direction on a sample () positioned in distance D below the electron lens (), the detected TKD () pattern comprising a plurality of image points x, yand mapping each of the detected image points x, yto an image point of an improved TKD pattern () with the coordinates x, yby using and inverting generalized terms of the form x=&#x3b3;*A+(1&#x2212;&#x3b3;)*B and y=&#x3b3;*C+(1&#x2212;&#x3b3;)*D wherein with Z being an extension in the z-direction of a cylindrically symmetric magnetic field Bof the electron lens (), and wherein A, B, C, D are trigonometric expressions depending on the coordinates x, y, with B and D defining a rotation around a symmetry axis of the magnetic field B, and with A and C defining a combined rotation and contraction operation with respect to the symmetry axis of the magnetic field B. The invention further relates to a measurement system, computer program and computer-readable medium for carrying out the method of the invention.

Method for improving transmission Kikuchi diffraction pattern

The present invention refers to an apparatus () and a method for detecting characteristics of a probe. In an embodiment, the apparatus () comprises a vacuum chamber () and a beam generator () adapted to generate a beam of charged particles within the vacuum chamber (). When the beam of charged particles falls onto the probe, interaction particles and/or interaction radiation are generated. The apparatus () further comprises an electromechanical unit () within the vacuum chamber () and a detector () comprising a plurality of detection units and being arranged on the electromechanical unit () allowing for the detector () to move from a first position () with respect to the beam generator () to a second position () with respect to the beam generator () and vice versa, upon a corresponding actuation of the electromechanical unit () performable from outside of the vacuum chamber ().

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Berlin, Germany

Daniel Radu Goran