Silterra Malaysia Sdn. Bhd.

Silterra

Daniel Lynne Towery

A chemical mechanical polishing apparatus includes a polishing pad. A pad conditioner includes a static conditioner head having a surface area configured to contact and condition the pad. The surface area has a first end proximate to an axis of rotation of the pad and a second end remote from the axis of rotation of the pad. The first end defines a first arc length, and the second end defines a second arc length, where the first arc length and the second arc length are substantially identical.

Growing community of inventors

Penang, Malaysia

Daniel Lynne Towery