Airgard, Inc.

Mattson Technology, Inc

Daniel L Messineo

Mark W Johnsgard

Kristian E Johnsgard

Robert T LoBianco

David E Sallows

Robert D Mailho

Husain Lohawala

Robert T Lobianco

A heated inlet tube for use in a wet scrubber is disclosed. In one embodiment, the heated inlet tube comprises a heated tube concentric to the inlet tube to which a heated gas is applied thereby maintaining temperature of a waste gas stream as it flows through the inlet tube. In a further embodiment, an insulating tube concentrically surrounds the heated tube to further maintain the temperature of the waste gas stream.

Concentrically heated inlet tube for gas scrubbing apparatus

Abatement systems are used to remove harmful pollutants resulting from manufacturing processes. Prior art abatement systems can dangerously back-flash due to, for example, changes in gas velocity and if the inlets become constricted due to clogs. To prevent back-flash a sprayer is introduced to an inlet of the abatement system. The sprayer sprays a volume of a cooling liquid, such as water, into the inlet. In the event of a back-flash, the liquid can extinguish the flame, preventing further damage to the abatement system. The sprayed liquid can provide further benefits, such as cooling the incoming, mitigating effects of reactions within the cooling gases, and flushing away solid particles that would otherwise clog the inlet. These further benefits can allow the abatement system to safely handle additional gases and larger volumes of incoming gas.

Systems and methods to prevent back-flash in an abatement system

Some industrial or fabrication processes generate effluent gas streams that require scrubbing. Scrubbing may include the use of one or more gases to abate the effluents for safer release into the environment. Systems and methods described herein provide a liquid-enclosed reaction chamber where an extended reaction zone or more than one reaction zone is formed. By having an extended reaction zone or more than one reaction zone, the effluent gas stream and the products of upstream reaction zones can be more completely abated. The reaction zones are formed by adding one or more gas ports into the reaction chamber downstream of a main burner nozzle.

Extended or multiple reaction zones in scrubbing apparatus

A resistive heater having a doped ceramic heating element embedded either partially or completely within a matrix of undoped ceramic material. The ceramic may be silicon carbide, and the dopant may be nitrogen. Many of the advantages of the present heater stern from the fact that the materials used for the heating elements and the matrix material surrounding those elements have substantially the same coefficient of thermal expansion. In one embodiment, the heater is a monolithic plate that is compact, strong, robust, and low in thermal mass, allowing it to respond quickly to power input variations. The resistive heater may be used in many of the reactors and processing chambers used to fabricate integrated circuits, such as those that deposit epitaxial films, and carry out rapid thermal processing.

Apparatuses and methods for resistively heating a thermal processing system

Systems and methods for epitaxial deposition. The reactor includes a hot wall process cavity enclosed by a heater system, a thermal insulation system, and chamber walls. The walls of the process cavity may comprises a material having a substantially similar coefficient thermal expansion as the semiconductor substrate, such as quartz and silicon carbide, and may include an isothermal or near isothermal cavity that may be heated to temperatures as high as 1200 degrees C. Process gases may be injected through a plurality of ports, and are capable of achieving a fine level of distribution control of the gas components, including the film source gas, dopant source gas, and carrier gas. The gas supply system includes additional methods of delivering gas to the process cavity, such as through temperature measurement devices, and through a showerhead.

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Fremont, CA, United States of America

Daniel L Messineo