Asml Netherlands B.v.

Daniel James Golich

Yezheng Tao

Igor Vladimirovich Fomenkov

Robert Jay Rafac

Daniel J W Brown

Richard L Sandstrom

Alexander Anthony Schafgans

Daniel John William Brown

Yoshiho Amada

Michael David Caudill

Techniques for forming a target and for producing extreme ultraviolet light include releasing an initial target material toward a target location, the target material including a material that emits extreme ultraviolet (EUV) light when converted to plasma; directing a first amplified light beam toward the initial target material, the first amplified light beam having an energy sufficient to form a collection of pieces of target material from the initial target material, each of the pieces being smaller than the initial target material and being spatially distributed throughout a hemisphere shaped volume; and directing a second amplified light beam toward the collection of pieces to convert the pieces of target material to plasma that emits EUV light.

Target for extreme ultraviolet light source

A system for an extreme ultraviolet (EUV) light source includes an optical amplifier including a gain medium positioned on a beam path, the optical amplifier configured to receive a light beam at an input and to emit an output light beam for an EUV light source at an output; a feedback system that measures a property of the output light beam and produces a feedback signal based on the measured property; and an adaptive optic positioned in the beam path and configured to receive the feedback signal and to adjust a property of the output light beam in response to the feedback signal.

Adaptive laser system for an extreme ultraviolet light source

Growing community of inventors

San Diego, CA, United States of America

Daniel James Golich