Applied Materials, Inc.

Daniel Hwung

Kalyanjit Ghosh

Kaushik Comandoor Alayavalli

Yuxing Zhang

Amit Kumar Bansal

Sanjeev Baluja

Ganesh Balasubramanian

Tejas Ulavi

Zhijun Jiang

Mayur G Kulkarni

Ashutosh Agarwal

Shailendra Srivastava

Shawyon Jafari

Yusheng Zhou

Priyanka Dash

Qiang Ma

Embodiments herein relate to gas distribution apparatuses. In one aspect, the disclosure herein relates to a showerhead including a body having an upper surface and a lower surface. A thermal choke is disposed adjacent a perimeter of the body. The thermal choke includes a plurality of interleaved channels. One or more apertures are disposed between the upper surface and the lower surface of the body.

Horizontal heat choke faceplate design

A faceplate for a processing chamber is disclosed. The faceplate has a body with a plurality of apertures formed therethrough. A flexure is formed in the body partially circumscribing the plurality of apertures. A cutout is formed through the body on a common radius with the flexure. One or more bores extend from a radially inner surface of the cutout to an outer surface of the body. A heater is disposed between flexure and the plurality of apertures. The flexure and the cutout are thermal chokes which limit heat transfer thereacross from the heater.

Faceplate with embedded heater

Systems and methods for depositing a film in a PECVD chamber while reducing residue buildup in the chamber. In some embodiments disclosed herein, a processing chamber includes a chamber body, a substrate support, a showerhead, and one or more heaters configured to heat the showerhead. In some embodiments, the processing chamber includes a controller.

System and method for substrate processing chambers

Growing community of inventors

Los Gatos, CA, United States of America

Daniel Hwung