Xenogen Corporation

Caliper Life Sciences, Inc.

Media Lario S.r.l.

University of California

Ultratech, Inc.

Euv Llc.

Euv Limited Liability Corporation

The United States of America As Represented by the United States

Daniel G Stearns

Bradley W Rice

Paul B Mirkarimi

Natale Ceglio

Donald W Sweeney

Andrew M Hawryluk

Michael D Cable

Tamara Troy

David G Nilson

Ganesh Sundaram

Stephen P Vernon

Tobias Daniel Wheeler

Boris Grek

Fabio E Zocchi

Giuseppe Valsecchi

Joshua I Molho

I-Jane Chen

Heng Xu

Richard Levesque

Chaincy Kuo

Danh C Tran

Scott Daniel Hector

Henry N Chapman

Claude Montcalm

Alexander V Dukhovny

Sasa C Bajt

Natale M Ceglio

Raymond Merrill, Jr

Robert David Banham

Daniel A Tichenor

Jacques Kools

John Ernst Bjorkholm

Gordon Yue

Giovanni Bianucci

Marco Pedrali

Eric M Gullikson

Sherry L Baker

Riccardo Binda

Dean Shough

Anton Barty

Disclosed are apparatus and methods for determining accurate optical property values of turbid media. In one embodiment, the method includes (a) providing a light source, having a first wavelength and a known illumination power, sequentially at a plurality of specific illumination positions on a first surface of the specimen; (b) for each specific position of the light source, obtaining light emission measurements from a second surface of the specimen that is opposite the first surface, wherein the light emission measurements are obtained for a plurality of surface positions of the second surface; and (c) for each specific illumination position of the light source at the first surface of the specimen, determining one or more optical properties for the specimen based on the specific illumination position of the light source, the first wavelength of the light source, the known illumination power of the light source, and the obtained light emission measurements for such each specific illumination position. The optical properties for the plurality of specific illumination positions of the light source are individually determined for each specific illumination position of the light source.

Apparatus and methods for determining optical tissue properties

The invention provides microfluidic devices, systems, and methods for manipulating an object within a channel of a microfluidic device using an external electrode. The device has a channel disposed within the device, the channel having no included electrodes. The channel has a wall, at least a portion of which is penetrable by an electric field generated external to the device, the wall being penetrable such that the electric field extends through the wall portion and into a region within the channel. The system includes the microfluidic device and an electrode external to and not bonded to the device. In the method, the external electrode is placed adjacent to the device and energized to generate an electric field that extends through the wall of the device and into the channel, thereby manipulating an object within the channel.

Manipulation of objects in microfluidic devices using external electrodes

Atomic Layer Deposition (ALD) is used for heteroepitaxial film growth at reaction temperatures ranging from 80-400&#xb0; C. The substrate and film materials are preferably matched to take advantage of Domain Matched Epitaxy (DME). A laser annealing system is used to thermally anneal deposition layer after deposition by ALD. In preferred embodiments, a silicon substrate is overlaid with an AlN nucleation layer and laser annealed. Thereafter a GaN device layer is applied over the AlN layer by an ALD process and then laser annealed. In a further example embodiment, a transition layer is applied between the GaN device layer and the AlN nucleation layer. The transition layer comprises one or more different transition material layers each comprising a AlGaN compound wherein the composition of the transition layer is continuously varied from AlN to GaN.

Method and apparatus for forming device quality gallium nitride layers on silicon substrates

An integrated microtomography and optical imaging system includes a rotating table that supports an imaging object, an optical stage, and separate optical and microtomography imaging systems. The table rotates the imaging object about a vertical axis running therethrough to a plurality of different rotational positions during a combined microtomography and optical imaging process. The optical stage can be a trans-illumination, epi-illumination or bioluminescent stage. The optical imaging system includes a camera positioned vertically above the imaging object. The microtomography system includes an x-ray source positioned horizontally with respect to the imaging object. Optical and x-ray images are both obtained while the imaging object remains in place on the rotating table. The stage and table are included within an imaging chamber, and all components are included within a portable cabinet. Multiple imaging objects can be imaged simultaneously, and side mirrors can provide side views of the object to the overhead camera.

Integrated microtomography and optical imaging systems

Atomic Layer Deposition (ALD) is used for heteroepitaxial film growth at reaction temperatures ranging from 80-400&#xb0; C. The substrate and film materials are preferably selected to take advantage of Domain Matched Epitaxy (DME). A laser annealing system is used to thermally anneal deposition layers after deposition by ALD. In preferred embodiments a silicon substrate is overlaid with an AIN nucleation layer and laser annealed. Thereafter a GaN device layers is applied over the AIN layer by an ALD process and then laser annealed. In a further example embodiment a transition layer is applied between the GaN device layer and the AIN nucleation layer. The transition layer comprises one or more different transition material layers each comprising a AlGacompound wherein the composition of the transition layer is continuously varied from AIN to GaN.

Systems and methods for synchronous operation of debris-mitigation devices (DMDs) in an EUV radiation source that emits EUV radiation and debris particles are disclosed. The methods include establishing a select relative angular orientation between the first and second DMDs that provides a maximum amount of transmission of EUV radiation between respective first and second rotatable vanes of the first and second DMDs. The methods also include rotating the first and second sets of vanes to capture at least some of the debris particles while substantially maintaining the select relative angular orientation. The systems employ DMD drive units, and an optical-based encoder disc in one of the DMD drive units measures and controls the rotational speed of the rotatable DMD vanes. Systems and methods for optimally aligning the DMDs are also disclosed.

Systems and methods for synchronous operation of debris-mitigation devices

A Sn vapor EUV LLP source system for EUV lithography is disclosed. The system generates a Sn vapor column from a supply of Sn liquid. The Sn column has a Sn-atom density of &#x3c;10atoms/cmand travels at or near sonic speeds. The system also has a Sn vapor condenser arranged to receive the Sn vapor column and condense the Sn vapor to form recycled Sn liquid. A pulse laser irradiates a section of the Sn vapor column. Each pulse generates an under-dense Sn plasma having an electron density of &#x3c;10electrons/cm, thereby allowing the under-dense Sn plasma substantially isotropically emit EUV radiation.

Sn vapor EUV LLP source system for EUV lithography

The invention provides devices, systems, and methods for extracting target objects from a sample. In the method, a stream of sample containing a plurality of target and non-target objects is directed by first and second streams of buffer through a sample inlet channel into a fluid junction and through the fluid junction into a sample waste channel. In response to detecting a target object within the stream of sample, an actuator is energized to close a normally open valve, resulting in a transient burst of cross-flow into the fluid junction that briefly diverts the flow of sample within the fluid junction and results in an aliquot of sample being directed into an aliquot delivery channel. The combination of the valve and the actuator acts as a self-limiting pulse generator.

Device and method for extracting target objects from a sample

The present invention provides systems and methods for obtaining a three-dimensional (3D) representation of one or more light sources inside a sample, such as a mammal. Mammalian tissue is a turbid medium, meaning that photons are both absorbed and scattered as they propagate through tissue. In the case where scattering is large compared with absorption, such as red to near-infrared light passing through tissue, the transport of light within the sample is described by diffusion theory. Using imaging data and computer-implemented photon diffusion models, embodiments of the present invention produce a 3D representation of the light sources inside a sample, such as a 3D location, size, and brightness of such light sources.

Method and apparatus for 3-D imaging of internal light sources

Source-collector modules for use with EUV lithography systems are disclosed, wherein the source-collector modules employ a laser-produced plasma EUV radiation source and a grazing-incidence collector. The EUV radiation source is generated by first forming an under-dense plasma, and then irradiating the under-dense plasma with infrared radiation of sufficient intensity to create a final EUV-emitting plasma. The grazing incidence collector can include a grating configured to prevent infrared radiation from reaching the intermediate focus. Use of debris mitigation devices preserves the longevity of operation of the source-collector modules.

Source-collector modules for EUV lithography employing a GIC mirror and a LPP source

A method of investigating the location and size of a light-emitting source in a subject is disclosed. In practicing the method, one first obtains a light intensity profile by measuring, from a first perspective with a photodetector device, photons which (i) originate from the light-emitting source, (ii) travel through turbid biological tissue of the subject, and (iii) are emitted from a first surface region of interest of the subject. The light-intensity profile is matched against with a parameter-based biophotonic function, to estimate function parameters such as depth and size. The parameters so determined are refined using data other than the first measured light intensity profile, to obtain an approximate depth and size of the source in the subject. Also disclosed is an apparatus for carrying out the method.

Imaging system

Systems, assemblies and methods for thermally managing a grazing incidence collector (GIC) for EUV lithography applications are disclosed. The GIC thermal management assembly includes a GIC mirror shell interfaced with a jacket to form a sealed chamber. An open cell, heat transfer (OCHT) material is disposed within the metal chamber and is thermally and mechanically bonded with the GIC mirror shell and jacket. A coolant is flowed in an azimuthally symmetric fashion through the OCHT material between input and output plenums to effectuate cooling when the GIC thermal management assembly is used in a GIC mirror system configured to receive and form collected EUV radiation from an EUV radiation source.

Thermal management systems, assemblies and methods for grazing incidence collectors for EUV lithography

Growing community of inventors

Los Altos, CA, United States of America

Daniel G Stearns