Flint Group Germany Gmbh

Daniel Fleischer

Thomas Telser

Matthias Beyer

Claudia May

The invention relates to a method for producing pictorial relief structures on a layer construction. The method comprises the provision of a layer construction having a substrate layer. After this, at least one fluid containing at least one first reactive component is applied pictorially to the substrate, wherein the pictorial application takes place in the form of a plurality of droplets with a droplet volume of less than 2 &#x3bc;l, and wherein the droplets are positioned pictorially. After this, there is an at least partial diffusing of the at least one first reactive component into the substrate layer for a predefined exposure time and/or an at least partial diffusing of at least one second reactive component into the pictorially positioned droplets of fluid for a predefined exposure time, wherein the substrate layer comprises the at least one second reactive component. The created relief is then fixed under the influence of heat and/or radiation via a reaction involving the first reactive component and/or the second reactive component. Further aspects of the invention relate to a pictorial relief structure produced according to the method and to the use of the pictorial relief structure as a printing form, as a microfluidic component, as a microreactor, as a phoretic cell, as a light-controlling element for color representation, as photonic crystals or as flexible parts of items of clothing.

Method for producing pictorial relief structures

The invention relates to a method for generative production of relief printing plates, wherein a support with a polymeric substrate layer and a laser-ablatable mask layer is provided, the polymeric substrate layer containing a first binder. A mask with openings corresponding to pixels is produced by imagewise laser ablation of the mask layer. A liquid containing a reactive monomer is then applied over the surface of the mask-covered polymeric substrate layer, and the liquid or the reactive monomer diffuses through the openings of the mask into the polymeric substrate layer for a defined exposure time so as to form a relief. The excess liquid or the excess monomer and optionally the mask are removed from the surface, and the resulting relief is fixed by crosslinking.

Growing community of inventors

Rheinau, Germany

Daniel Fleischer