Morton International, Inc.

Rohm & Haas Electronic Materials LLC

Shipley Company LLC

Other

Rohm and Haas Company

Nichigo-morton Co., Ltd.

Eternal Technology Corporation

Norton International, Inc.

Nichigo-morton

Daniel E Lundy

Robert K Barr

Edward J Reardon

Edgardo Anzures

James G Shelnut

Matthew L Moynihan

Nicola Pugliano

Hai Bin Zheng

Shigeru Murakami

Eiji Kosaka

Nathan Pawlowski

Corey O'Connor

Stephen E Bottomley

Mitchell G Male

Lincoln Eramo, Jr

Betsy Dadah

Thanh N Tran

Michael Ellis Dunham

Nick Warren Dunham

Stephen Wheeler

Edward J Brady

Embodiments of the present invention are related to a football training tool with an angled head, a rectangular frustum body, a pair of upper lateral rails, a pair of bottom lateral rails and a bottom. The upper later rails, defined as arms, include foot angle guides. The football training tool may also include a top alignment notch on its head and a bottom alignment notch on its bottom.

Football training tool

A polymer having &#x3b1;,&#x3b2; unsaturated groups and a group that generates a free radical when exposed to actinic radiation. The polymer may be self-cross-linking.

Functional polymer

A dry film photoresist includes a functional polymer. The functional polymer has &#x3b1;,&#x3b2;-unsaturated groups and groups that generate a free radical upon exposure to actinic radiation.

Dry film photoresist

Provided are compositions which include a polymer, having units of the formula (RSiO), wherein R is a substituted or unsubstituted organic group, and a plurality of functional end groups. A first component is provided for altering the solubility of the composition in a dried state upon activation. A second component contains a plurality of functional groups chosen from epoxides, oxetanes, vinyl ethers and combinations thereof. The second component is present in an effective amount to improve flexibility of the composition in a dried state before and after activation. Also provided are flexible optical waveguides, methods of forming flexible optical waveguides and electronic devices that include a flexible optical waveguide.

Waveguide compositions and waveguides formed therefrom

Provided are compositions suitable for use in forming a flexible optical waveguide. The compositions include a polymer, having units of the formula (RSiO), wherein R is a substituted or unsubstituted organic group, and a plurality of functional end groups. A first component is provided for altering the solubility of the composition in a dried state upon activation. A second component contains a plurality of functional groups chosen from hydroxy, amino, thiol, sulphonate ester, carboxylate ester, silyl ester, anhydride, aziridine, methylolmethyl, silyl ether, and combinations thereof. The second component is present in an effective amount to improve flexibility of the composition in a dried state before and after activation. Also provided are flexible optical waveguides, methods of forming flexible optical waveguides and electronic devices that include a flexible optical waveguide.

A composition and method to reduce photolithographic residue and scum formation on a substrate or in a solution, and to reduce or prevent foam formation. The composition contains a diphenyl oxide compound in combination with an antifoam agent. The composition may be added to developer solutions and stripper solutions used in manufacturing printed wiring boards.

Photoresist processing aid and method

A composition and method to reduce or to prevent residue and scum formation on a substrate or in a solution. The composition contains an aromatic alkoxylate in combination with a polyol or ether or ester of a polyol. The composition also reduces or prevents foam formation such as in developing processes in the manufacturing of printed wiring boards.

Residue and scum reducing composition and method

A negative-acting photoimageable composition useful as a primary imaging resist in the manufacture of printed circuit boards comprises an acid-functional binder polymer, a photopolymerizable component, and a photoinitiator chemical system, in which all or a portion of the photopolymerizable component comprises a (meth)acrylate functional urethane oligomer, wherein the (meth)acrylate functionality is separated from the urethane linkage by at least two alkylene oxide groups and at least one ring-opened lactone group for improved flexibility, tenting strength, fine line adhesion, developer scumming, coupled with unexpectedly improved resistance to processing chemicals, such as alkaline developing solutions, acid etching solutions, and acid plating baths, and stripping ability in strong alkaline aqueous stripping solutions.

Photoimageable compositions having improved flexibility and stripping ability

An oligomer is provided having tetraacrylate functionality as well as carboxylic acid functionality. The oligomer is useful as a photopolymerizable binder in photoresists for forming printed circuitry. Particular advantages of the oligomer are found in solder mask-forming compositions which must withstand the conditions of nickel/gold plating.

Photoimageable composition having photopolymerizeable binder oligomer

Aqueous developing solutions for reduced developer residue

A negative-acting photoimageable composition useful as a primary imaging resist in the manufacture of printed circuit boards comprises an acid-functional binder polymer, a photopolymerizable component, and a photoinitiator chemical system, in which the binder polymer has an anhydride functional backbone half-esterified with a meth(acrylate) functional hydroxy-terminated oligomer, wherein the meth(acrylate) functionality is separated from the half-ester linkage by at least two alkoxylate groups and at least one ring opened lactone group for improved stripping ability in strong alkaline aqueous stripping solutions, while maintaining good chemical resistance to other processing chemicals, such as alkaline developing solutions, acid etching solutions, and acid plating baths.

Photoimageable compositions having improved chemical resistance and

An alkaline aqueous developing solution for developing photoresists or the like contains, as an anti-scum agent, an ethoxylated surfactant having the general formula:

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Pomona, CA, United States of America

Daniel E Lundy