Hewlett-Packard Development Company, L.p.

Daniel C Gardner

Arthur Piehl

Sriram Ramamoorthi

An optical system having a radiation transparent member and an anti-reflective embossment embossed into at least one surface of the transparent member. The embossment has spaced structures configured to permit incident radiation to pass through the embossment and the radiation transparent member, and to, at least, attenuate reflection of the incident radiation off the embossment. The structures are maximally spaced from one another by a subwavelength of the incident radiation.

Optical system with nanoscale projection antireflection layer/embossing

An antireflection surface formed using a plurality of nanostructures of a first material on a surface of a second material. The first material is different from the second material. The distribution of spatial periods of the nanostructures is set by a self-assembly operation. The surface of the second material is converted to operate as a graded index surface that is substantially antireflective for the wavelength of interest.

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Corvallis, OR, United States of America

Daniel C Gardner