Advanced Technology Materials, Inc.

Daniel B Studebaker

Thomas H Baum

Galena Doubinina

Brian A Vaartstra

Gregory T Stauf

A method of forming an A site deficient thin film manganate material on a substrate from corresponding precursor(s), comprising liquid delivery and flash vaporization thereof to yield a precursor vapor, and transporting the precursor vapor to a chemical vapor deposition reactor for formation of an A site deficient manganate thin film on a substrate. The invention also contemplates a device comprising an A site deficient manganate thin film, wherein the manganate layer is formed on the substrate by such a process and is of the formula LaMMnO, where M=Mg, Ca, Sr, or Ba, and (x+y)&#x3c;1.0, and preferably from about 0.5 to about 0.99.

Composition and method for forming doped A-site deficient thin-film manganate layers on a substrate

A method of forming an A site deficient thin film manganate material on a substrate from corresponding precursor(s), comprising liquid delivery and flash vaporization thereof to yield a precursor vapor, and transporting the precursor vapor to a chemical vapor deposition reactor for formation of an A site deficient manganate thin film on a substrate. The invention also contemplates a device comprising an A site deficient manganate thin film, wherein the manganate layer is formed on the substrate by such a process and is of the formula La.sub.x M.sub.y MnO.sub.3, where M=Mg, Ca, Sr, or Ba, and (x+y)&lt;1.0, and preferably from about 0.5 to about 0.99.

Compositions and method for forming doped A-site deficient thin-film

An MOCVD precursor composition useful for MOCVD formation of a non-linear optically active metal borate thin film, comprising: (I) an organometallic source reagent for a metal reactively forming a non-linear optically active metal borate, and (II) an organoborate compound of the formula: B(OR).sub.3, wherein each R is independently selected from H, alkyl, aryl, alkaryl, arylalkyl, alkenyl, fluoroalkyl, fluoroaryl, fluoroaralkyl, fluoroalkaryl, trialkylsilyl, and C.sub.5 -C.sub.8 carbocylic groups, as the aforementioned borate source reagent. Such composition may be employed for forming a non-linear optically active metal borate thin film on a substrate, via depositing by CVD on said substrate a metal from the organometallic source reagent and a borate from the organoborate compound, to react the metal with the borate and yield the non-linear optically active metal borate on the substrate. Non-linear optically active devices, such as data storage devices, laser printers, display panels, and communications devices, can be fabricated using the composition and method of the invention.

Growing community of inventors

Brookline, MA, United States of America

Daniel B Studebaker